Ion beam lithography

Ion beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small structures such as integrated circuits or other nanostructures.

Ion beam lithography has been found to be useful for transferring high-fidelity patterns on three-dimensional surfaces.

单词	Ion beam lithography
释义	Ion beam lithography 英语百科 Ion beam lithography Ion beam lithography is the practice of scanning a focused beam of ions in a patterned fashion across a surface in order to create very small structures such as integrated circuits or other nanostructures. Ion beam lithography has been found to be useful for transferring high-fidelity patterns on three-dimensional surfaces.
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