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单词 optical lithography
释义

optical lithography

美 
英 
  • un.光刻
  • 网络光学光刻;光学微影;光微影术
un.
1.
光刻

例句

释义:
1.
As the density of VLSI circuit increases, the proximity effect has been one of the critical issues in optical lithography.
随着超大规模集成电路(VLSI)图形密度的增大,临近效应已成为光学光刻的关键问题之一。
d.wanfangdata.com.cn
2.
Diffraction also determines the smallest feature that can be created by optical lithography processes in the microchip industry.
绕射同时也限制了微晶片工业中的光微影术制程所能制作的最小线宽。
192.192.169.81
3.
This paper has described the accuracy of part built by stereo optical lithography technology.
论述立体光造形技术中零件的精度问题。
www.chemyq.com
4.
The Fundamental Limits of Optical Lithography.
光刻的限制。
bigsaw.blogchina.com
5.
Fundamental Principles of Optical Lithography: The Science of Microfabrication
光刻技术基本原理:微型制造学
www.cnpbook.com
6.
Resolution Enhancement Techniques in Optical Lithography
光学平版印刷术的坚定增加技术
www.eisc.com.cn
7.
Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System
光学和电子束曝光系统之间的匹配与混合光刻技术
www.cjs.ac.cn
8.
The Present Situation of Optical Lithography and Its Future
光学光刻技术现状及发展趋势
service.ilib.cn
9.
Application of Surfactant in the Optical Lithography Technology for IC Chip
表面活性剂在IC芯片光刻工艺中的应用
www.ilib.cn
10.
In the 30 years since lithography modeling was first introduced, optical lithography simulation has
在那石版印刷术模型首先被介绍后30年,光学的石版印刷术模拟有
zhidao.baidu.com
1.
The Status of Optical Lithography and the Market of Lithography Equipment
光学光刻现状及设备市场
service.ilib.cn
2.
Off-axis illumination for optical lithography
光学光刻中的离轴照明技术
scholar.ilib.cn
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更新时间:2025/8/5 2:33:22