The RTP temperature, the RTP time, the cooling rate, the ambient and the dopant atoms influenced the density and distribution of point defects in wafers, and then affected oxygen precipitates.
This instrument is based on definite weight, independent of fuel density, viscosity, impurities and ambient temperature.
本仪器采用定重量法，不受燃油密度、粘度、杂质含量、环境温度等影响。
3
Hard and wear-resistant titanium nitride coatings were deposited by pulsed high energy density plasma technique on silicon nitride ceramic cutting tools at ambient temperature.