| 单词 | 离子束 | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| 释义 | 离子束 noun —ion beam nSee also:离—without (sth) • be away from • independent of • part from • mythical beast (archaic) • surname Li • (in giving distances) from • ☲ 束—bind • bundle • bunch • surname Shu
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作为离子束蚀刻 (IBE) 和磁性物理气相沉积 (PVD) 技术领域的全球领先厂商，Veeco [...] 利用其经验和出众的工艺知识应对新一代 MEMS 和传感器设备的核心挑战。 veeco.com.cn | As the world’s leader in Ion Beam Etch (IBE) and magnetic [...] Physical Vapor Deposition (PVD) technology, Veeco leveraged its [...]experience and superior process knowledge to meet the critical challenges of next generation MEMS and sensor devices. veeco.com |
公司实现收入近 10 [...] 亿美元，并且推出一项新的 Veeco 认证设备业务，以满足对旧离子束蚀 刻 和沉积系统全面翻新和测试服务的需求。 veeco.com.cn | The company achieved nearly $1 billion in revenue and launched a new Veeco Certified [...] Equipment business designed to satisfy demand for fully refurbished and [...] tested pre-owned ion beam etch and deposition [...]systems. veeco.com |
作为 NEXUS 系列的一员，此系统可以与离子束蚀 刻 、 离子束 沉 积 和物理气相沉积等其他 Veeco 技术一起集成在通用硬件和软件平台上。 veeco.com.cn | As part of the NEXUS family, this system [...] can be integrated on a common hardware and software platform with complementary Veeco [...] technologies, such as ion beam etch, ion beam deposition [...]and physical vapor deposition. veeco.com |
依靠 Veeco 久经考验的离子束沉积 技术，SPECTOR® 不仅可以提高沉积率、批量和目标利用率，还能够缩短加工时间。 veeco.com.cn | Building on [...] Veeco's proven ion beam deposition technology, [...]the SPECTOR-HT increases deposition rates, lot sizes, target [...]utilization and reduces time to process. veeco.com |
利用 Veeco 12厘米 RF 离子源改进长期连续反应性工艺的性能和质量，例如高度控制的光学镀膜 的 离子束 辅 助 沉积 或 离子束 沉 积。 veeco.com.cn | Improve the performance and quality of long uninterrupted [...] reactive processes such as ion beam [...] assist or ion beam deposition of highly controlled optical coatings with the Veeco 12cm RF Ion Source. veeco.com |
了解 Veeco 的 SPECTOR-HT 高级离子束系统 如何有助于生产出质量最佳的光学薄膜，同时还可以提升生产率和产量。 veeco.com.cn | Learn how Veeco's [...] SPECTOR-HT Advanced Ion Beam System can help [...]you produce the highest quality optical thin films with improved productivity and throughput. veeco.com |
用于高频率电子设备和光电产品的 III-V 材料：离子束蚀刻 解决方案不仅可避免基于 CI 的反应离子束蚀刻的损坏效应，而且可以针对许多应用维持卓越的侧壁控制和重复性，如高频集成电路元件、LED 触点和高电子迁移率晶体管 (HEMT)。 veeco.com.cn | III-V Materials for [...] High-Frequency Electronics and Optoelectronics: Ion beam etch solutions avoid the damaging effects of CI-based reactive ion beam etch while [...]maintaing superior sidewall [...]control and repeatability for applications such as high-frequency integrated circuit components, LED contacts and high electron mobility transisters (HEMT). veeco.com |
使用 NEXUS® IBE-420Si™ 离子束蚀刻 系统，可最大程度地增加滑片良率，实现优异 的 离子束 蚀 刻 一致性。 veeco.com.cn | Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE-420Si™ Ion Beam Etching System. veeco.com |
聚焦式离子束显微镜(FIB)的利用镓(Ga)金属作为离子源，再加上负电场 (Extractor) 牵引尖端细小的镓原子，而导出镓 离子束 再 以电透镜聚焦，经过一连串变化孔径 (Automatic Variable Aperture, AVA)可决定离子束的大 小，再经过二次聚焦至试片表面，利用物理碰撞来进行特定图案的加工，一般单粒子束的FIB(Single Beam FIB)，可以提供材料切割、沈积金属、蚀刻金属和选择性蚀刻氧化层等功能。 ma-tek.com | Focused Ion Beam microscope (FIB) use gallium (Ga) as a metal ion source, coupled with negative electric field (Extractor) traction-the-art small gallium atoms, and the export of gallium ion beam in order to re-focus lens power after a series of changes in the aperture ( Automatic Variable Aperture, AVA) may determine the size of the ion beam, and then after [...] the second focus on [...]the surface of the collision use of physical to specific patterns of processing, single-General of the particle beam FIB (Single Beam FIB), can provide cutting material, Metal deposition, metal etching and selective oxidation has features such as etching. ma-tek.com |
作为世界领先的 MBE 以及离子束系统 和组件的提供商，Veeco 随时准备帮助您立即生产满足未来需要的材料和设备，以及制定相应的制程。 veeco.com.cn | As the world's leading [...] supplier of MBE and Ion Beam systems and components, [...]Veeco is ready to help you produce the materials, [...]processes and devices of tomorrow...today. veeco.com |
通过 NEXUS IBE-420i™ 离子束蚀刻系统，可提高数据存储器件良率并可达到优异的均匀性。 veeco.com.cn | Raise data storage device yields and achieve exceptional uniformity with the [...] NEXUS® IBE-420i™ Ion Beam Etching System. veeco.com |
查看 NEXUS 离子束沉积系统（非常适用于 MRAM 应用及硬盘驱动器读写头）如何改善对于所有准直沉积应用的控制。 veeco.com.cn | See how our NEXUS Ion Beam Deposition System, [...] ideal for MRAM applications as well as read/write heads used in hard disk [...]drives, provides improved control for all collimated deposition applications. veeco.com |
基于 Veeco 的尖端 NEXUS 离子束蚀刻平台。 veeco.com.cn | Based on Veeco's [...] cutting-edge NEXUS ion beam etch platform. veeco.com |
晶片加工设备、单结晶制造设备、曝光·成像清晰度设备、保护剂处理设备、蚀刻设备、干蚀刻设备、热处理设备、薄膜开成设备（CVD设备、溅射设备、其他）、离子注入设备、CMP设备、洗涤干燥设备、各种搬运系统·设备、纯水·药液·水处理设备、各种气体设备、切割成片设备、微型·纳米金属模、纳米刻印制造设备 、 离子束 加 工 设备、微小放电加工设备、片成形设备、挤压/浇铸/喷射成形设备、加压成形设备、激光微型加工设备、成膜加工设备、干燥炉、烧成/烧结设备、微波加热设备、熔融工序设备、粉碎工序设备、超声波加工机、晶片接合设备（校准器）、深挖蚀刻设备（面向MEMS）、清洁室设备等。 jpcashow.com | Wafer processing equipment, single crystal production device, exposure/depiction device, resist processing equipment, etching equipment, dry etching device, heat processing device, thin film forming device (CVD devices, sputtering devices, etc.), ion injection device, CMP equipment, cleaning-drying equipment, various transportation systems and equipment, pure water/chemical liquid/water processing equipment, various gas devices, [...] dicing equipment, micro/nano dies, [...] nano imprint device, ion beam processing equipment, [...]micro radiation processing equipment, [...]sheet forming equipment, extrusion/casting/injection molding machine, pressurized forming equipment, laser micro processing equipment, thin film coating equipment, drying furnaces, burning/sintering equipment, microwave heating equipment, dissolution process equipment, fracturing process equipment, ultrasound processing equipment, wafer bonding equipment (aligner), deep etching equipment (for MEMS), clean room equipment, etc. jpcashow.com |
作为离子束蚀刻和磁性 PVD 技术的世界级领导者，拥有超过 20 年丰富经验的 Veeco 将这个机会呈现在 MEMS 和传感器行业的面前。 veeco.com.cn | As the world’s leader in IBE and magnetic PVD technology, with over 20 years of experience, Veeco provides this opportunity to the MEMS and sensor industry. veeco.com |
Veeco 公司将其设计为专门与 End-Hall [...] 离子源的等离子特性相配合，有助于确保制程运行具有较高的生产力及精确控 制 离子束 输 出。 veeco.com.cn | Engineered by Veeco to specifically match the plasma [...] characteristics of End Hall ion sources, it helps ensure highly productive process runs and [...] precise control of ion beam output. veeco.com |
当今，只有 Veeco 有资格提供高级离子束源和 组件（设计为具有高稳定性和齿形系数以满足任何系统设计要求）以及整个蚀刻 、 离子束和 M BE 沉积系统，从而以最高的资本效率提供最优质的光学薄膜。 veeco.com.cn | Veeco is uniquely qualified to [...] supply advanced ion beam sources and components engineered for high reliability and form factors to fit any system design, as well as complete etch, ion beam and MBE deposition [...]systems proven to deliver [...]the highest quality optical films with the highest capital efficiency. veeco.com |
中等尺寸离子源，适合于清洗和刻蚀应用以 及 离子束 溅 射 沉积和类钻膜 (DLC) 应用，或者在低能操作时作为辅助源。 veeco.com.cn | Mid-size ion beam source for cleaning and etching applications, as well as ion beam sputter deposition, [...] diamond-like coating [...](DLC) applications or as an assist source at low energy operation. veeco.com |
我们是 MOCVD、MBE、离子束和其 他高级薄膜工艺技术的市场领导者。 veeco.com.cn | We are the market leader [...] in MOCVD, MBE, Ion Beam and other advanced thin [...]film process technologies. veeco.com |
MEMS 和磁性传感器：可通过 Veeco 的离子束蚀刻、离子束沉积 和物理气相沉积系统，对复杂薄膜层结构进行精确控制，从而造就更为小巧的规格和集成组合设备。 veeco.com.cn | MEMS and Magnetic [...] Sensors: Veeco's ion beam etch, ion beam deposition and physical [...]vapor deposition systems allow for precision [...]control of complex thin film layer structures that result in smaller form factors and integrated combination devices. veeco.com |
离子束。 spellmanhv.cn | Ion Beam. spellmanhv.com |
ALS 1500 阳极层源是一种可为预清洁、蚀刻、表面改性 、 离子束 溅 射 沉积 (IBD) 及离子束辅助沉积 (IBAD) 提供电源密度和均匀性的大幅面源。 veeco.com.cn | The ALS 1500 anode layer [...] source is a large format source that provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD). veeco.com |
研究所成立之后得到的第一项任务，正是其拿手的 电 子束 和 离子束 技 术。 vonardenne.biz | The first tasks that were worked on after the [...] founding of the Institute were predominantly those attached to the [...] established areas of electron and ion beam technology. vonardenne.biz |
若结合场发射式电子显微镜进行实时观测，即所谓的双粒子束FIB(Dual Beam FIB)，除了以高能离子束进行直接蚀刻的功能外，可藉由气体辅助蚀刻系统的帮助，提高蚀刻的选择比与提升蚀刻速率，并可直接进行特定材料的沈积。 ma-tek.com | If the combination of field emission electron microscope to conduct real-time [...] observation, the so-called dual-beam [...] FIB (Dual Beam FIB), in addition to direct high-energy ion-beam etching of [...]the functions can be [...]etched by gas-assisted system to help improve the choice of etching material, enhance the etching rate, and direct deposition of specific materials. ma-tek.com |
AIM、SELA独特的适应性离子研磨技术比传统的聚 焦 离子束 （ FI B）激素和优越；它可以将从大面积材料制作的样品厚度降低到20纳米以下，精确度高、无伪影质量、厚度变化可控且产量较高。 cn.camtek.co.il | AIM, SELA’s unique [...] Adaptive Ion Milling technology, is superior to the traditional Focused Ion Beam (FIB) technology; [...]it can reduce lamella [...]thickness below 20 nanometers over a large area with high precision, artifact-free quality, controlled thickness variation and higher throughput. camtek.co.il |
相较于一般由芯片正面进行分析的方式，藉由试片制备技术，晶背分析能减少因入 射 离子束 所 造 成的植入及撞入效应与离子诱发金属表面粗糙效应，因而更能真实呈现铜扩散的分布情形。 ma-tek.com | In addition to front side materials analysis conventionally, back side SIMS analysis can minimize the ion mixing effect induced by ion sputtering from metal layer top of the front side. ma-tek.com |
斯派曼定制针对专业应用的一系列电源产品：质谱仪, 电子枪,离子束,供电 设备,毛细血管电泳,静电纺织 ,电容器充放电, [...] 静电吸盘 ,图像增强器,以及磁控管等。 spellmanhv.cn | Spellman's custom and application specific power supplies are used in a wide [...] range of applications like: Mass [...] Spectrometry, Electron and Ion Beam Sources, Power [...]Feed Equipment, Capillary Zone Electrophoresis, [...]Electrospinning, Capacitor Charging, Electrostatic Chucks, Image Intensifiers and Magnetrons. spellmanhv.com |
微污染分析：SIMS另一主要应用为表面成份污染分析，如球型数组封装基板中金属垫之污染监控，然而受限于入 射 离子束 大 小 ，建议之分析面积大于80*80μ㎡，因此，SIMS分析、欧杰电子显微镜与X光光电子能谱仪(或称化学分析能谱仪)，亦属表面分析或成份分析之重要工具。 ma-tek.com | Thus, SIMS analysis is also named as one of surface analyses of Elemental analysis techniques, like Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) / electron spectroscopy of chemical analysis (ESCA). ma-tek.com |
阿登纳研究所在等离子体物理学领域内的第一个研发项目，是1963年的 等 离子束 喷 枪 （左侧照片），其作用原理是基于高压电弧的物理规则。 vonardenne.biz | The first project developed by the Manfred von Ardenne Institute in the plasma physical field was the plasma torch (picture left) in 1963, which worked on the basis of the physical principles of the high-pressure electric arc. vonardenne.biz |
委员会敦促塞浦路斯政府采取有效措施， 结 束 对 流 离 失 所 者身份妇女 的 子 女 的歧 视性待遇。 daccess-ods.un.org | The Committee urges the Government to adopt [...] effective measures to end the discriminatory treatment of children of women with displaced person status. daccess-ods.un.org |
英汉双解词典包含2273206条英汉词条，基本涵盖了全部常用单词的翻译及用法，是英语学习的有利工具。