Plasma-enhanced chemical vapor deposition

（重定向自PECVD）

PECVD machine at LAAS technological facility in Toulouse, France.

This commercial system was designed for the semiconductor field and contains three 8

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

单词	PECVD
释义	PECVD 英汉-汉英词典 abbr. 等离子体增强化学汽相沉积（Plasma Enhanced Chemical Vapor Deposition）词组 \| 习惯用语您要查找的是不是： peck vi. 啄食；扔石头；吹毛求疵 vt. 啄食；扔 covet vt. 垂涎；觊觎 vi. 垂涎；觊觎 PECVD abbr. 等离子体增强化学汽相沉积（Plasma Enhanced Chemical Vapor Deposition）网络短语: PECVD method 等离子体化学气相沉积法 PECVD system 化学气相沉积系统 ECR-PECVD 电子回旋共振等离子体增强化学气相沉积 pecvd detail 英文全名为 VHF PECVD 甚高频等离子体化学气相沉积 rf PECVD 射频PECVD VHF-PECVD 甚高频电源; 积法; 技术; PECVD Systems 等离子淀积 Centrother PECVD 设备新员工学习手册英语百科 Plasma-enhanced chemical vapor deposition （重定向自PECVD） Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.
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PECVD

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网络短语:

Plasma-enhanced chemical vapor deposition