Megasonic cleaning

Megasonic Cleaning is a type of acoustic cleaning, related to ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is used in wafer, medical implant, and industrial part cleaning.

Similar to ultrasonic cleaning, megasonics utilizes a transducer that usually sits atop a piezoelectric substrate. The transducer creates an acoustic field at a much higher frequency (typically 0.8–2 MHz) compared to ultrasonic cleaning (20-200 kHz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.

单词	Megasonic cleaning
释义	Megasonic cleaning 英语百科 Megasonic cleaning Megasonic Cleaning is a type of acoustic cleaning, related to ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is used in wafer, medical implant, and industrial part cleaning. Similar to ultrasonic cleaning, megasonics utilizes a transducer that usually sits atop a piezoelectric substrate. The transducer creates an acoustic field at a much higher frequency (typically 0.8–2 MHz) compared to ultrasonic cleaning (20-200 kHz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.
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