This article mainly explains the process of LIGA technology, which includes X - ray lithography, - electroforming and - copy.

本文主要阐述了LIGA技术 的工艺过程, 包括 X 射线深层光刻 、 微电铸和微复制工艺.

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The overlay or multi - exposure in deep X - ray lithography could be well solved using the mask.

采用该掩模,可进一步解决深 X 射线光刻中的重复对准多次曝光问题.

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The fabrication procedure of the mask and results of the deep X - ray lithography are given.

给出了该掩模设计制作工艺过程及深 X 射线光刻结果.

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