The key to the technology is the gridless plasma source ( GIS ).

该技术核心是无栅等离子体源 ( GIS ).

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ZrN thin films were prepared on 45 # steel by using ECR - microwave plasma source enhanced deposition.

利用ECR - 微波等离子溅射沉积技术不同偏压下在45 # 钢基体上制备了ZrN薄膜.

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The hollow cathode will be presented as a plasma source for reactive evaporation processes.

空心负极将被提出作为血浆来源为易反应的蒸发过程.

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