The principle, tools and characteristics of the electrochemical - mechanical polishing were introduced.

介绍了电化学 — 机械抛光的原理 、 工具及特点.

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The three - in - one combination technology -- electrochemical polishing, mechanical polishing and electrochemical etching punching are introduced.

介绍了一种先进的电化学抛光 、 常规的机械抛光和电化学蚀刻打标三合一技术.

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The Chemical mechanical polishing technique in the field of semiconductor industry was introduced.

介绍了半导体工业中蓬勃发展的化学机械抛光(CMP)技术.

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This dual - function machine provides you the versatility of both ultrasonic and mechanical polishing.

超音波及电动手机双功率输出,提供您多重功能之各种研磨及抛光功能.

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