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单词 dry etching
释义

dry etching

美 
英 
  • un.干腐蚀;干刻蚀
  • 网络乾蚀刻;乾式蚀刻;干蚀刻
un.
1.
干腐蚀
2.
干刻蚀

例句

释义:
1.
The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.
这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。
ip.com
2.
Multicolour woodblock print, dry etching of painting and etching copper intaglio techniques in this period appear and develop.
多色木版画、干刻铜版画和腐蚀铜凹版画技法在这一时期出现和发展。
www.fabiao.net
3.
Dry etching technique of silicon is a very important process in the modern semiconductor industry.
对硅的干法刻蚀技术是现代半导体工业中非常重要的一项工艺。
cn.qikan.com
4.
and dry etching the transition layer of the AMR film.
干法刻蚀各向异性磁电阻效应薄膜的过渡层。
ip.com
5.
Besides, the anti-dry etching property is improved.
同时,也改善了抗干刻蚀的性能。
ip.com
6.
The inductance is just above the ditch which is formed in dry etching and 0. 5-10 micrometer deep.
电感在沟渠的正上方,沟渠以干蚀刻形成,深度为0.5微米至10微米之间。
www.sinopat.org
7.
High performance gallium nitride based blue light emitting diode material epitaxy and dry etching fabrication technology
氮化镓基高亮度发光二极管材料外延和干法刻蚀技术
www.ilib.cn
8.
Research on Optimizing Etching Parameters of the Dry Etching for Silicon Dioxide
二氧化硅干法蚀刻参数的优化研究
service.ilib.cn
9.
Study of Resultants on the Chamber Wall in the Process of Dry Etching of Silicon Gratings
硅栅干法刻蚀工艺中腔室表面附着物研究
www.ilib.cn
10.
Dry Etching of Thick Aluminum Film for Q-improvement of Spiral Inductors on Silicon
改善硅基螺旋电感品质因数的厚铝膜干法刻蚀
www.ilib.cn
1.
Research of dry etching simulator in micromachining
微加工干法刻蚀工艺模拟工具的研究现状
www.ilib.cn
2.
Dry etching for high aspect ratio microstructures
深高宽比微结构的干法刻蚀
www.ilib.cn
3.
Effects of mask characteristics on InP etched- facets by using inductively coupled plasma dry etching
电感耦合等离子体刻蚀InP端面的掩膜特性研究
www.ilib.cn
4.
Research on Dry-Etching Gratings and Wet-Etching Gratings
光栅干法刻蚀与湿法刻蚀的研究
service.ilib.cn
5.
Fabrication of Field Emitter Array with Dry Etching
干法刻蚀制作场发射阴极阵列
www.ilib.cn
6.
Effects of Gas Carriers on Dry Etching of Silicon Dioxide
携带气体对二氧化硅干法刻蚀的影响
service.ilib.cn
7.
processing the second conductive layer by dry etching with the use of the mask;
通过使用所述抗蚀剂掩模进行干法蚀刻而处理所述第二导电层;
ip.com
8.
New Development in Dry Etching of GaN
氮化镓干法刻蚀研究进展
service.ilib.cn
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更新时间:2025/2/28 0:39:18