| 单词 | electron beam lithography |
| 释义 | 例句释义: 电子束平印术,电子束平版印刷,电子束光刻,电子束微影 1. Electron beam lithography technique has developed in recent thirty years. It has been used in many fields such as micro fabrication. 电子束曝光技术是近三十年来发展起来的一门新兴技术，目前广泛应用于微细加工等各种领域。 www.juhe8.com 2. A conic primitive based intermediate pattern and its data format of electron beam lithography are defined. 在一种新的电子束曝光机二次曲线单元图的基础上定义了一种中间图形数据格式。 www.dictall.com 3. Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers. 用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。 www.bing.com 4. Approaching higher resolution is the critical issue for electron-beam lithography. 追求更高的分辨率是电子束曝光研究的核心内容。 www.boshuo.net 5. This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators. 论文首先简要介绍了国内外电子束曝光技术的发展水平和图形发生器的工作原理。 www.lw23.com 6. There are two major topics in my research. One is the research of electron-beam lithography proximity effect correction. 在本篇论文有两个主题，一个是电子术微影邻近效应的修正，另一个抗反射层的制备。 ir.lib.ncu.edu.tw 7. Optimization Design of Immersion Magnetic Lenses Used for Projection Electron Beam Lithography 用于投射式电子束曝光系统的磁浸没透镜的优化设计 www.ilib.cn 8. Ferromagnetic Resonance Study on the Permalloy Submicron Rectangular Arrays Prepared by Electron Beam Lithography 电子束光刻亚微米矩形阵列的坡莫合金薄膜铁磁共振谱的研究 168.160.184.82:8080 9. Studies of energy dissipation distribution in low-energy electron beam lithography by Monte Carlo method 方法研究低能电子束曝光沉积能分布规律 www.ilib.cn 10. Three-Dimensional Fabrication by Electron Beam Lithography Using Overlapped Increment Scanning 电子束重复增量扫描生成三维结构的研究 www.ilib.cn 1. An Application of the Monte Carlo Simulation of Low-Electron Beam Lithography in Proximity Effect Correction 低能电子束散射模拟在邻近效应修正中的应用 www.ilib.cn 2. Principle of electron beam lithography and its application on the nanofabrication and nanodevice 电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用 www.ilib.cn 3. Monte Carlo Simulation of Electron Scattering Trajectories in Low-Energy Electron Beam Lithography 方法模拟低能电子束曝光电子散射轨迹 ilib.cn 4. Research on Relativistic Rutherford Formula for High-energy Electron Beam Lithography 基于高能电子束曝光的相对论卢瑟福公式研究 ilib.cn 5. Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography 用电子束曝光方法在优化设计的绝缘体上硅脊状波导上实现布拉格光栅的制作和评价 www.ilib.cn 6. Application of chemically amplified resists in electron beam lithography 化学放大胶在电子束光刻技术中的应用 www.ilib.cn 7. Broad Band Photoluminescence in Active Channels Produced by Electron Beam Lithography on LiF Films 电子束照射LiF薄膜有源沟道的宽带光致发光 physics.72s.cn 8. Fabrication of the Master for Soft Lithography by Electron Beam Lithography 电子束光刻制造软刻蚀用母板的研究 www.ilib.cn 9. High Voltage Scanning Electron Beam Lithography for Nanostructure 纳米级高压扫描电子束曝光技术 www.ilib.cn 10. Technology of Adjusting the Projection Electron-beam Lithography with Demagnification Imaging 缩小投影电子束曝光机的调试技术 www.ilib.cn 1. Development of mask for scattering with angular limitation projection electron-beam lithography 电子束散射角限制投影光刻掩模研制 www.ilib.cn 2. Methods of proximity effect correction in electron beam lithography 电子束光刻中邻近效应校正的几种方法 www.ilib.cn 3. Simulation of the proximity effect of electron beam lithography 电子束光刻的邻近效应及其模拟 www.ilib.cn 4. Research of figures with high aspect ratio made by electron beam lithography system 利用电子束曝光系统制作高深宽比图形的研究 service.ilib.cn 5. Deflection system for electron beam lithography 电子束曝光机的偏转系统 www.ilib.cn 6. A new type of projection electron beam lithography with angular limitation 一种新型的具有角度限制的电子束投影曝光技术 www.ilib.cn 7. Electron beam lithography based on overlapped increment scanning 电子束重复增量扫描曝光技术 www.ilib.cn 8. Pattern Digital Controller for Electron-beam Lithography System Based on PC 基于PC机控制的电子束图形控制器 www.ilib.cn |
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