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单词 chemical-mechanical
释义

chemical-mechanical

  • 网络化学及机械;基本上光程是化及械
1.
化学及机械
基本上抛光制程是化学及机械(Chemical-Mechanical)的反应机构。由抛光液中的NaOH、KOH、NH4OH腐蚀晶圆最表面层,抛 …
www.2ic.cn
2.
基本上光程是化及械
基本上光程是化及械(Chemical-Mechanical)的反。由光液中的NaOH、KOH、NH4OH腐晶最表面,光布、矽酸晶的械摩擦作用 …
9512.net

例句

释义:
1.
Bachelor degree in Mechanical engineer or equivalent, preferred education background in Welding, Chemical Mechanical.
本科以上学历,机械背景,焊接,化工机械,无损检测,动力设备专业优先;
www.jobui.com
2.
Company under: food packaging, medicine machinery, beverage equipment, machinery manufacturing, 000 of the chemical, mechanical chain.
公司下设:食品包装、药业机械、饮料设备、机械制造、万联化工、机械连锁。
www.tonke.cn
3.
Diamond disk conditioners have long served the semiconductor chemical mechanical polishing (CMP) process for polish pad dressing.
钻石修整器应用于化学机械抛光中抛光垫的修整,已有很长的一段时间。
www.ceps.com.tw
4.
Chemical-Mechanical Polish (CMP) - A process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing.
化学-机械抛光(CMP)-平整和抛光晶圆片的工艺,采用化学移除和机械抛光两种方式。
www.solarzoom.com
5.
A chemical mechanical polishing pad comprising a water-insoluble matrix which comprises (A) a styrene polymer and (B) a diene polymer.
一种化学机械抛光垫,包含由(A)苯乙烯聚合物和(B)二烯聚合物构成的非水溶性基质。
www.1168818.cn
6.
The invention provides a chemical-mechanical polishing composition for polishing a substrate.
本发明提供用于抛光基板的化学机械抛光组合物。
ip.com
7.
Knowledge of air, chemical, mechanical, water and hazardous waste regulatory requirements.
了解关于空气,化学,机械,水和有害废物的监管要求的知识。
blog.163.com
8.
Grain boundary material directly influences the physical, chemical, mechanical and other properties.
晶界直接影响着材料的物理、化学、力学等性能。
paper.pet2008.cn
9.
Degree in Engineer or equivalent, Chemical Engineering or Chemical Mechanical is prefer.
工程类本科以上专业,最好为化学工程或化工机械类专业。
www.gao8dou.com
10.
As chemical-mechanical synergetic effects are optimal, the removal rate is extremum.
机械化学协调作用时,去除率始终保持极值去除。
www.ceps.com.tw
1.
Superior chemical, mechanical and heat resistance, can be used as cover for beakers .
抗化学性良好,耐温性佳,可当烧杯盖使用。英文简述。
dictsearch.appspot.com
2.
Embarked from the component and structure of phosphate laser glass, its chemical-mechanical polishing (CMP) mechanism is analyzed.
从磷酸盐激光玻璃的成分和结构出发,分析了其化学机械抛光(CMP)机制。
www.cnoptics.net
3.
Bachelor or higher in Chemical, Mechanical Engineering.
本科学士及以上学历,化工、机械工程相关专业。
www.lietou.com
4.
The process is based on chemical, mechanical, electrolytic deoiling for high efficiency low consumption, low cost deoiling.
本工艺依据化学、机械、电化学去油的原理,达到高效率、少投入、低成本去除油污的目的。
www.tdict.com
5.
Be familiar with maintenance work in chemical mechanical, electrical and instrumental area.
精通化工机械、电气及仪表领域维护工作。
www.bingojob.cn
6.
The sacrificial layer is removed through an etching process such as chemical mechanical planarization.
该牺牲层是通过例如化学机械平面化的蚀刻工艺除去的。
ip.com
7.
Evaluating Chemical-, Mechanical-, and Bio-Pulping Processes and Their Sustainability Characterization Using Life -cycle Assessment
用生命周期评价化学、机械和生物制浆方法可持续性发展特点
www.ilib.cn
8.
Applied Study of Electrochemistry Theory on the Copper Chemical-mechanical Polishing
铜化学机械抛光中电化学理论的应用研究
ilib.cn
9.
Simulation for an Abrasive Particle of the Chemical Mechanical Polishing with AFM
基于AFM的化学机械抛光磨粒模拟研究
ilib.cn
10.
Hydrodynamic Analysis of Chemical Mechanical Polishing with Circular Translational Moving
圆平动化学机械研抛过程的流体动力性能分析
ilib.cn
1.
Study on Fixed-abrasive Chemical-mechanical Polishing Technology of Wafer in Integrate Circuit Manufacturing
集成电路制造中的固结磨料化学机械抛光技术研究
ilib.cn
2.
Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing
ULSI制造中铜化学机械抛光的腐蚀磨损机理分析
ilib.cn
3.
Application and research of endpoint-detection technology for chemical mechanical polishing of large size wafer
大直径硅晶片化学机械抛光及其终点检测技术的研究与应用
www.ilib.cn
4.
Recent Progress in Study on Material Removal Mechanisms of Silicon Wafer During Chemical Mechanical Polishing
半导体芯片化学机械抛光过程中材料去除机理研究进展
ilib.cn
5.
Analysis of Influences on Within-wafer-nonuniformity of Motion Form in Wafer Chemical Mechanical Polishing
硅片化学机械抛光时运动形式对片内非均匀性的影响分析
ilib.cn
6.
fiber, tobacco, paper, printing, chemical mechanical equipment; In recent years,
纤、卷烟、造纸、印刷、化工的机械设备;
wenku.baidu.com
7.
Application of Chemical Mechanical Polishing Technology on the Finish Machining
化学机械抛光技术在超精加工中的应用
ilib.cn
8.
Research of Chemical Mechanical Polishing Technique of Sapphire Substrate
蓝宝石衬底的化学机械抛光技术的研究
service.ilib.cn
9.
Bachelor degree in technique background, applied Chemical or Chemical Mechanical etc. will be preferred;
工科本科以上学历,最好应用化学或化工机械等专业;
www.gao8dou.com
10.
Research and Prospects on Copper Chemical Mechanical Polishing in ULSI Manufacturing
ULSI制备中铜布线化学机械抛光技术的研究与展望
www.ilib.cn
1.
Synergistic Effects between Birch Chemical Mechanical Pulps and Aspen Bleached Kraft Pulp
桦木化学机械浆和杨木漂白硫酸盐浆之间的协同作用
www.ilib.cn
2.
Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing
介质的化学机械抛光
www.wanfangdata.com.cn
3.
RBR control applied on chemical -mechanical polishing process in ULSI manufacturing
RBR控制在超大规模集成电路制造的化学机械抛光工艺中的应用
www.ilib.cn
4.
Characterization of Chemical Mechanical Planarization With White Light in Interferometry
用白光干涉测量法描述化学机械抛光面
ilib.cn
5.
Galvanic Corrosion of TiN-W Electro-couple During Tungsten Chemical Mechanical Polishing
钨的化学机械抛光过程中TiN-W电偶的腐蚀行为
www.ilib.cn
6.
A Chemical Mechanical Polishing Model Based on the Viscous Flow of the Amorphous Layer
一种基于非晶层粘性流动的机械化学抛光模型
ilib.cn
7.
Recent Advancement of Chemical-Mechanical Polishing Technology of Metal
金属的化学-机械抛光技术研究进展
service.ilib.cn
8.
Material Removal Mechanism and Model in Chemical Mechanical Polishing of Silicon Wafers
硅晶片化学机械抛光材料去除机制与模型
ilib.cn
9.
Chemical Effect Mechanism in Chemical Mechanical Polishing for Silicon Wafer
硅晶片化学机械抛光中的化学作用机理
www.ilib.cn
10.
Research on Surface Topography of Silicon Wafer in Chemical-mechanical Polishing
硅片化学机械抛光中表面形貌问题的研究
ilib.cn
1.
Chemical Mechanical Polishing of Sapphire Substrate
蓝宝石衬底片化学机械抛光的研究
www.ilib.cn
2.
Micro-Polar Effects of Flow Features of Slurries in Chemical Mechanical Polishing Process
化学机械抛光中抛光液流动的微极性分析
www.ilib.cn
3.
Technology analysis of wafer chemical mechanical polishing in the manufacture of ULSI
超大规模集成电路制造中硅片化学机械抛光技术分析
www.ilib.cn
4.
Analysis on Flow Properties of Chemical Mechanical Polishing Process
化学机械抛光流动性能分析
ilib.cn
5.
Study on Chemical Mechanical Polishing Technology for CdSe Wafer for Detectors
探测器晶片化学机械抛光工艺研究
jtxb.cn
6.
constitutive model of chemical - mechanical damage in concrete
力学损伤本构模型
www.ichacha.net
7.
Study on the Chemical Mechanical Polishing of Large Diameter Lithium Niobate Wafer
大直径铌酸锂晶片的化学机械抛光研究
service.ilib.cn
8.
Comparison of Chemical and Chemical Mechanical Pulps from Hardwoods
阔叶木化学浆与化学机械浆性能的对比研究
www.ilib.cn
9.
Effects of nano-scale particles in chemical mechanical polishing process
化学机械抛光中纳米颗粒的作用分析
www.ilib.cn
10.
Analysis and Research on Copper Chemical-mechanical Polishing
铜布线化学机械抛光技术分析
ilib.cn
1.
Research on the planarity in the copper Chemical mechanical polishing process
铜化学机械抛光中的平坦性问题研究
www.ilib.cn
2.
Chemical Mechanical Polishing for Silicon Wafer Planarization by Exerting Partial Region Load
单晶硅片的区域载荷法平坦化抛光
www.ilib.cn
3.
The Application of Group Technology in Chemical Mechanical Plants
成组技术在化工机械厂的应用
ilib.cn
4.
Study on Abrasive Effect in Copper Chemical-Mechanical Polishing
磨料对铜化学机械抛光过程的影响研究
ilib.cn
5.
Advances in Chemical Mechanical Polishing
化学机械抛光技术的研究进展
service.ilib.cn
6.
Effect of Corrosion Inhibitor in the Chemical Mechanical Polishing of Copper
缓蚀剂在铜化学机械抛光过程中的作用研究
www.ilib.cn
7.
Analysis on Pad Effects in Chemical Mechanical Polishing
化学机械抛光中抛光垫作用分析
www.ilib.cn
8.
Modeling of Chemical Mechanical Polishing Material Removal Based on Molecular-Scale Mechanism
基于单分子层去除机理的芯片化学机械抛光材料去除模型
www.ilib.cn
9.
Development of Chemical Mechanical Polishing Slurry
化学机械抛光液的研究进展
www.ilib.cn
10.
Diagnosis on the Faults in the Chemical Mechanical Equipment
化工机械设备故障诊断实例
www.ilib.cn
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更新时间:2025/2/6 3:22:17