| 单词 | vapour deposition | ||||
| 释义 | vapour deposition
例句释义: 气相沉积,化学气相沉积 1. And electro-deposition and metal vapour deposition could also be applied to create highly porous metallic structures. 电沉积法以及气相沉积法可用于制备高孔隙率的金属泡沫材料。 www.magsci.org 2. The utility model relates to a photochemical vapour deposition equipment which is the special equipment produced by a semiconductor device. 本实用新型涉及一种半导体器件生产的专用设备。 ip.com 3. A physical vapour deposition process applies the low friction, ceramic coating. 用物理蒸汽沉淀工艺施加低摩擦陶瓷涂层。 www.skf.com 4. The present article introduces a new technique of chemical vapour deposition titanium Carbide. 本文介绍了一种新的化学气相沉积碳化钛方法。 www.usstjournal-ss.com 5. In this paper, we review emphasizedly several chemical vapour deposition methods and some properties of silicon nitride thin film. 本文着重评述了制备氮化硅薄膜的几种化学气相沉积方法和一些性能。 www.chemyq.com 6. Plasma enhanced chemical vapour deposition Nanocrystalline tungsten carbide thin films 化学气相沉积制备碳化钨纳米晶薄膜 ilib.cn 7. Control and characterization of individual grains and grain boundaries in graphene grown by chemical vapour deposition 石墨烯的培育采用化学气相沉积法 www.techreviewchina.com 8. Study on modification of instrument surface by the vapour deposition of molybdenum hexacarbonyl 羰基钼化学气相沉积对模具表面改性的研究 www.ilib.cn 9. Tribological Characteristics of TiN and TiCN Hard Coatings Prepared by Pulsed D. C. Plasma Enhanced Chemical Vapour Deposition 脉冲直流等离子体辅助化学气相沉积TiN和TiCN薄膜摩擦磨损特性研究 www.ilib.cn 10. Analysis and study on the capability of aluminium films prepared by electron beam vapour deposition and magnetron sputtering 电子束蒸发与磁控溅射镀铝的性能分析研究 service.ilib.cn 1. Numerical Simulation and Analysis of Flow Field in Low Pressure Metalorganic Chemical Vapour Deposition Reactor 低压金属有机化学气相外延生长室热流场的模拟与分析 www.ilib.cn 2. Synthesis of aligned carbon nanotube and their growth mechanism by chemical vapour deposition method 化学气相沉积法制备定向碳纳米管及其生长机理的研究 service.ilib.cn 3. The investigations of membrane structure and process of chemical vapour deposition of carbonyl metals 羰基金属气相沉积工艺条件及膜结构研究 www.ilib.cn 4. Development on High Vacuum Chemical Vapour Deposition Furnace 高真空化学气相外延炉的研制 service.ilib.cn 5. Specifications of physical vapour deposition TiN films 物理气相沉积TiN薄膜技术条件 www.bz01.com 6. Effects of Substrate Materials on Kinetics of Chemical Vapour Deposition of TiN 钢基体中碳与铁对化学气相沉积TiN动力学的影响 www.ilib.cn 7. Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition 螺旋波等离子体增强化学气相沉积氮化硅薄膜 www.ilib.cn 8. Design of gas distributor on plasma chemical vapour deposition 等离子体化学气相沉积的布气装置之设计 service.ilib.cn |
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