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单词 vapor deposition
释义

vapor deposition

美 
英 
  • un.汽相淀积;蒸汽沉积
  • 网络气相沉积;气相淀积;气相沉积法
un.
1.
汽相淀积
2.
蒸汽沉积

例句

释义:
1.
The invention provides an auxiliary gauge used in a physical vapor deposition device and a maintenance method thereof.
本发明提供了一种用于物理气相沉积装置的辅助治具及其维护方法。
ip.com
2.
Resin impregnation was used to density carbon fiber preforms after they had been densified by chemical vapor deposition (CVD).
将炭纤维坯体CVD增密至不同密度,再对其进行树脂浸渍。
www.dictall.com
3.
To produce flexible transistor arrays powerful enough to drive a display, engineers employ a process called chemical vapor deposition.
为了生产强大到可以驱动显示的可弯曲晶体管序列,工程师们使用了一种称为“化学气相沉积”(chemicalvapordeposition)的流程。
www.bing.com
4.
The substrate is subjected to a chemical vapor deposition (370) of a carbon-containing gas to grow a non-woven fabric of carbon nanotubes.
使基片进行含碳气体的化学气相沉积,以生长碳纳米管的非织造织物。
ip.com
5.
In their experiments, the scientists grew the diamond films using "pulsed liquid injection chemical vapor deposition techniques. "
在他们的试验中,科学家用脉冲液体喷射的化学汽相沉积技术来增大钻石薄膜的尺寸。
www.bing.com
6.
All coatings were prepared by hybrid physical vapor deposition processes, combining magnetron sputtering and pulsed laser deposition.
所有涂料通过混合物理气相沉积过程,结合磁控溅射和脉冲激光沉积的制备。
emuch.net
7.
This paper gives an overview of plasma enhanced chemical vapor deposition (PECVD) used in the solar industry.
本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。
www.ceps.com.tw
8.
Catalytic chemical vapor deposition synthesis of helical carbon nanotubes and triple helices carbon nanostructure.
化学气相沉积合成螺旋碳纳米管和三重螺旋纳米碳结构
baike.soso.com
9.
A swiveling cover serves for time limiting of vapor deposition and therefore it essentially limits the thermal stress for the substrates.
阿旋转支付服务的时间限制气相沉积法,因此,它基本上限制了热应力的基板。
zhidao.baidu.com
10.
A novel high reflectivity type of semiconductor saturable absorption mirror grown by metal organic chemical vapor deposition is presented.
利用金属有机气相淀积方法生长了一种新型吸收体:高反射率半导体可饱和吸收镜。
www.dictall.com
1.
In recent years, chemical vapor deposition diamond research has made great progress, and in some areas it has reached the practical stage.
近年来,化学气相沉积金刚石的研究取得了很大进展,在某些方面已达到了实用阶段。
www.fabiao.net
2.
the activation includes air and carbon dioxide activation , and deposition includes chemical vapor deposition of benzene.
所采用的活化方法为空气活化和二氧化碳活化法。沉积方法为苯沉积。
www.ichacha.net
3.
CVD diamond thick film, synthesized by hot-filament chemical vapor deposition method, is pure polycrystalline diamond.
热丝CVD法沉积金刚石厚膜为全晶质纯多晶金刚石材料,是制造切削刀具的理想材料。
www.ceps.com.tw
4.
Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.
建立了快速沉积高品质金刚石膜的热阴极辉光放电等离子体化学气相沉积新方法。
www.ceps.com.tw
5.
Amorphous silicon is deposited at low temperature with plasma-enhanced chemical vapor deposition (PECVD).
非晶硅是存放在低温等离子体增强化学气相沉积(等离子体增强化学气相沉积)。
zhidao.baidu.com
6.
In our work, the material is prepared by the method of Physical Vapor Deposition(PVD) and is optimized by ions implantation.
本文提出了利用物理气相沉积(PVD)的方法来制备这些电池材料,并利用离子注入技术进行改性,取得了一些有价值的结果。
www.juhe8.com
7.
The silicon oxide films on aluminum alloys matrix were prepared by chemical vapor deposition (CVD) in ambient pressure.
采用常压CVD方法在铝合金基底上制备出硅氧化合物陶瓷膜层。
www.chemyq.com
8.
Nano-sized silicon films with large area were prepared by normal Low Pressure Chemical Vapor Deposition method.
利用普通低压化学气相沉积技术在玻璃衬底上制备了大面积的纳米硅薄膜。
www.chemyq.com
9.
In this paper, substrate materials of diamond films by chemical vapor deposition are discussed.
讨论了化学气相沉积金刚石薄膜的各种衬底材料。
www.dictall.com
10.
Fabrication methods including electroless plating, chemical vaPOr deposition, sol-gel technique and other methods are briefly discussed.
对化学镀、化学气相沉积、溶胶-凝胶法及其它涂层制备方法作了扼要讨论。
www.magsci.org
1.
In this paper a technique of fabricating micro lenses with spherical surface by laser chemical vapor deposition (LCVD) was introduced.
本文介绍了一种新颖的利用激光化学汽相沉积(LCV)球面微透镜的技术。
www.dictall.com
2.
In a preferred embodiment, the codeposition is carried out by plasma enhanced chemical vapor deposition.
在较佳具体实施例中,该共沉积作用系以等离子体强化化学气相沉积法进行。
ip.com
3.
The methods of preparing diamond films by chemical vapor deposition were reviewed.
评述了金刚石薄膜的化学气相沉积方法。
www.chemyq.com
4.
Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.
等离子体化学气相沉积技术制备氢化硅薄膜工艺条件成熟稳定而成为薄膜制备的首选方法。
www.dictall.com
5.
Solid powder and chemical (vapor) deposition are normal methods.
常规的沉积方法为固体粉末法和气相沉积法。
epub.cnki.net
6.
Synthesis of multi-walled carbon nanotubes(MWCNTs) by floating catalysts with ethanol chemical vapor deposition(ECVD) was presented.
介绍了采用浮动催化剂法,利用乙醇化学气相沉积法制备多壁碳纳米管。
www.chemyq.com
7.
The chemical vapor deposition uses vapor whose safeguard and seal make the method be restricted.
气相沉积法由于涉及气体,其保护措施和密闭性的严格要求使其应用受到了严格的限制。
epub.cnki.net
8.
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法。
www.showxiu.com
9.
The advances of chemical vapor deposition in the field of material preparation were reviewed.
在此基础上,综述了化学气相沉积技术在材料制备领域的最新进展。
www.chemyq.com
10.
This essay focuses on the process of preparing Carbon nanotubes by using the method of Chemical Vapor Deposition(CVD).
本文研究了用化学气相沉淀法(CVD)制备碳纳米管的工艺。
goabroad.zhishi.sohu.com
1.
To study the reaction mechanism of CVD (chemical vapor deposition) reaction system, quantum chemistry methods are proved highly potential.
量子化学方法在研究化学气相沉积反应体系的反应机理、动力学计算方面有很大的潜力。
www.chemyq.com
2.
Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition
甚高频等离子体增强化学气相沉积制备微晶硅太阳电池的研究
service.ilib.cn
3.
Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition
微波电子回旋共振等离子体化学气相淀积法制备非晶氟化碳薄膜的研究
www.ilib.cn
4.
Study of the Application of Vapor Deposition of TiN Coatings in Dies Surface Strengthening Treatment
气相沉积TiN技术在模具表面强化中的应用研究
www.ilib.cn
5.
Preliminary Study of Nickel Nanocrystals Encapsulated in Carbon Shells by Chemical Vapor Deposition
化学气相沉积合成碳包裹镍纳米晶的初步研究
service.ilib.cn
6.
Study of Glow Discharge Effect on Alignment Growth of Carbon Nanotubes by Negative Bias-enhanced Hot Filament Chemical Vapor Deposition
辉光放电对负偏压增强热丝化学气相沉积碳纳米管的准直生长作用研究
www.ilib.cn
7.
Pulse laser vapor deposition technology and its application in fabrication of the ICF film-targets
脉冲激光气相沉积技术及其在ICF薄膜靶制备中的应用
www.ilib.cn
8.
Numerical Simulation of a Flat Planetary Fixture for Physical Vapor Deposition
平面行星夹具的物理气相沉积均匀性计算
www.ilib.cn
9.
Structural properties of nanocrystalline silicon films deposited by helicon wave enhanced chemical vapor deposition
螺旋波等离子体沉积纳米硅薄膜结构特性
www.ilib.cn
10.
Comparison of Tribological Behaviors of Ti-Si-N Coatings Prepared by Magnetically Controlled Sputtering and Pulsed Chemical Vapor Deposition
磁控溅射和脉冲直流化学气相沉积Ti-Si-N薄膜摩擦磨损性能对比研究
ilib.cn
1.
Research on Preparation of Silicon Nitride Nano-powders with Laser Induced Chemical Vapor Deposition and Optical Characteristics of Powders
激光诱导化学气相沉积法制备纳米氮化硅及粉体光谱特性研究
service.ilib.cn
2.
Fabrication of Polycrystalline ZnSe by Chemical Vapor Deposition and Its Properties
低压化学气相沉积法制备ZnSe多晶及其性能研究
www.ilib.cn
3.
Production of a-CH films by hollow cathode discharge plasma chemical vapor deposition
采用空心阴极放电等离子体化学气相沉积方法制备a-CH薄膜
service.ilib.cn
4.
Research of Discrete Formulation of Mixed Finite Element Methods for the Vapor Deposition Chemical Reaction Equations
蒸汽沉淀化学反应方程混合元法的离散格式研究
service.ilib.cn
5.
Study of diamond film by direct current cathode-hot filament chemical vapor deposition
直流等离子体-热丝化学气相沉积金刚石薄膜的研究
www.ilib.cn
6.
Thermal Stability of Nanocrystalline Diamond Films Grown by Biased Enhanced Microwave Plasma Chemical Vapor Deposition
以偏压增强微波等离子体化学蒸镀法进行生长的纳米晶金刚石薄膜之热稳定性
nm.stlib.gd.cn
7.
In situ diagnosis of chemical species for the growth of carbon nanotubes in microwave plasma-enhanced chemical vapor deposition
应用于微波等离子增强化学蒸镀法之碳纳米管生长化学类别原位鉴定
nm.stlib.gd.cn
8.
Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon
螺旋波等离子体化学气相沉积纳米硅薄膜的光学发射谱研究
www.ilib.cn
9.
Optical and Electrical Properties of Polyimide Thin Films Doped Cu-Phthalocyanine by Vapor Deposition Polymerization
气相沉积法制备含酞菁铜聚酰亚胺薄膜的光电性能
www.ilib.cn
10.
Metalorganic Chemical Vapor Deposition of GaNAs Alloy Using Dimethylhydrazine as Nitrogen Precursor
采用二甲基肼为氮源进行GaNAs的金属有机化学气相沉积生长
www.ilib.cn
1.
Well-aligned Carbon Nanotube Array Synthesized at Low Temperature by Microwave Plasma Enhanced Chemical Vapor Deposition
微波等离子体辅助化学气相沉积法低温合成定向碳纳米管阵列
www.ilib.cn
2.
Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine
氯参与的化学气相淀积金刚石的热力学分析
www.ilib.cn
3.
Fabrication of High-Performance Dispersion Compensating Fiber by Plasma Chemical Vapor Deposition
以等离子体化学蒸镀法合成之高性能弥散补偿纤维
nm.stlib.gd.cn
4.
Synthesis of Ordered Mesoporous Carbon from Furfuryl Alcohol by Vapor Deposition Polymerization Method
糠醇蒸汽沉积聚合法制备有序中孔炭分子筛
www.ilib.cn
5.
Preparation of Regular Coiled Carbon Nanotubes by Reduced-pressure Catalytic Chemical Vapor Deposition
减压化学气相沉积法制备规则螺旋状纳米碳管
www.ilib.cn
6.
Spatial Distribution of Optical Emission Spectrum in Electron-Assisted Chemical Vapor Deposition of Diamond
电子助进化学气相沉积金刚石中发射光谱的空间分布
ilib.cn
7.
Study of DLC Films by Carbon Ion Beam Implantation Assisted Vapor Deposition
碳离子束注入辅助蒸发低温沉积DLC薄膜研究
www.ilib.cn
8.
Chemical vapor deposition furnaces for the densification of carbon-carbon composites;
用于碳碳复合材料增密的化学气相沉积炉
www.zftrans.com
9.
Microstructures and Properties of Molybdenum Coating Prepared by Chemical Vapor Deposition
化学气相沉积难熔金属钼组织性能的研究
www.ilib.cn
10.
Influence of pressure on nucleation of diamond by microwave plasma enhanced chemical vapor deposition synthesis
系统压强对微波等离子体化学气相沉积金刚石成核的影响
ilib.cn
1.
Preparation of Nano-silicon Films by Low Pressure Chemical Vapor Deposition and Their Electrical Properties
纳米硅薄膜的低压化学气相沉积和电学性能研究
www.ilib.cn
2.
Computer Simulation and Visualization of Growth Processes of Chemical Vapor Deposition Diamond Film
化学气相沉积金刚石膜生长过程的计算机仿真及可视化
www.ilib.cn
3.
Research Progress on Tribological Properties of Diamond Films Produced by Chemical Vapor Deposition
化学气相沉积金刚石薄膜的摩擦学性能研究进展
service.ilib.cn
4.
Synthesis of Vertically Aligned Carbon Nanotubes Using Thermal Chemical Vapor Deposition
定向碳纳米管薄膜的制备
www.ilib.cn
5.
Analysis on Optical and Electrical Properties of Polyimide Thin Films by Vapor Deposition Polymerization
气相沉积法制备聚酰亚胺薄膜的光、电特性研究
www.ilib.cn
6.
Effect of Substrate Temperature on Optical Emission Spectra in Electron-Assisted Chemical Vapor Deposition of Diamond
电子助进化学气相沉积金刚石中衬底温度对发射光谱的影响
www.ilib.cn
7.
Synthesis of Straight Carbon Nanotube Films by Microwave Plasma Chemical Vapor Deposition at Low Temperature
微波等离子体化学气相沉积法低温制备直纳米碳管膜
service.ilib.cn
8.
Monte Carlo simulation of optical emission spectra in electron assisted chemical vapor deposition of diamond
电子助进化学气相沉积金刚石中发射光谱的蒙特卡罗模拟
www.ilib.cn
9.
Preparation and Thermal Behavior of AB-Type Polyimide Monomers for Vapor Deposition Polymerization
AB型聚酰亚胺单体的合成及气相沉积聚合研究
www.ilib.cn
10.
Formation of Palladium-Platinum Alloy Films on Polyimide by Catalyst-Enhanced Chemical Vapor Deposition
催化增强化学蒸气沉积法在聚酰亚胺上沉积钯-铂合金薄层
www.ilib.cn
1.
Surface growth mechanism of cubic boron nitride thin films prepared by plasma-enhanced chemical vapor deposition
等离子体增强化学气相沉积法制备立方氮化硼薄膜过程中的表面生长机理
wulixb.iphy.ac.cn
2.
Development and Application of Electron Beam Physical Vapor Deposition Technology
电子束物理气相沉积技术的发展和应用
service.ilib.cn
3.
Application of Vapor-deposition Coatings on Magnesium Alloys Surface Modification
气相沉积膜层在镁合金表面改性中的应用
www.ilib.cn
4.
Catalyst-Enhanced Chemical Vapor Deposition of Palladium-Platinum Bilayer Films on Polyimide
聚酰亚胺上催化剂增强化学气相沉积钯-铂双层膜
www.ilib.cn
5.
Development of Physical Vapor Deposition System Used in Material Chips Fabrication
物理气相法制备材料芯片的发展
www.ilib.cn
6.
Effect of Plasma Enhanced Chemical Vapor Deposition Parameters on Characteristics of Silicon nitride Film
等离子增强型化学气相沉积条件对氮化硅薄膜性能的影响
www.ilib.cn
7.
Preparation of Nanocrystalline SiC Films by Hot Filament Chemical Vapor Deposition at Low Temperature
热丝化学气相沉积法低温制备纳米晶态碳化硅薄膜
scholar.ilib.cn
8.
Low pressure chemical vapor deposition synthesis of InN nanowires and their field electron emission
InN纳米线的低压化学气相沉积及其场发射特性研究
www.ilib.cn
9.
Equipment for the vapor deposition of elements or compounds on heated filament substrates;
用于使元素和化合物气相沉积在被加热的纤维基体上的设备
www.zftrans.com
10.
Photoluminescence of Amorphous Si Films Prepared by AtmosphericPressure Chemical Vapor Deposition
常压化学气相沉积方法制备非晶硅薄膜及其光致发光性能研究
www.ilib.cn
1.
Study on the application of chemical vapor deposition of TiN coatings in dies surface strengthening treatment
化学气相沉积TiN技术在模具表面强化中的应用研究
ilib.cn
2.
Patterned Growth of Well-aligned Carbon Nanotube Arrays on Quartz Substrates by Chemical Vapor Deposition
定向碳纳米管阵列在石英玻璃基底上的模板化生长研究
www.ilib.cn
3.
Synthesis of Diamond Films at Low Temperature Via Glow Plasma Assisted Hot Filament Chemical Vapor Deposition
辉光等离子体辅助化学气相沉积低温合成金刚石薄膜的研究
www.opticsjournal.net
4.
Experimental research for the preparation of iron nano-films by chemical vapor deposition
化学气相沉积法制备纳米铁薄膜的实验研究
scholar.ilib.cn
5.
Structure and growth behavior of low N-doped diamond film by microwave plasma assisted chemical vapor deposition
微波等离子体化学气相沉积合成掺氮金刚石薄膜的缺陷和结构特征及其生长行为
ilib.cn
6.
Friction and Wear Behavior of Diamond-Like Carbon Film Prepared by Plasma Enhanced Chemical Vapor Deposition
用等离子体增强化学气相沉积技术制备类金刚石碳薄膜的摩擦磨损性能研究
ilib.cn
7.
Synthesis of Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition at Low Temperature
微波等离子体化学气相沉积法低温合成纳米碳管
www.ilib.cn
8.
Effects of vacuum slowly vapor deposition parameters on coating quality and diamond properties
真空微蒸发镀覆工艺参数对镀层质量及金刚石性能的影响
www.ilib.cn
9.
Study on deposition parameter of diamond film prepared by plasma hot-filament chemical vapor deposition
等离子热丝化学气相沉积金刚石膜工艺参数研究
www.ilib.cn
10.
Pulsed Laser Vapor Deposition Technology: Current Status and Research Progress
脉冲激光气相沉积技术现状与进展
service.ilib.cn
1.
The Synthesis of Diamond and Carbon Nitride by Dc. Glow Discharge Plasma Enhanced Chemical Vapor Deposition
直流辉光放电等离子体增强化学气相法制备金刚石及氮化碳薄膜
www.ilib.cn
2.
Investigation on the Fabrication of Micro Carbon Pillar by Laser-induced Chemical Vapor Deposition
通过激光诱导化学气相沉积来制造微碳柱的研究
www.ilib.cn
3.
magnetic - field - aided plasma enhanced chemical vapor deposition
磁场辅助等离子体增强化学气相沉积
www.ichacha.net
4.
Industrial Applications of Chemical Vapor Deposition Diamond Films
化学气相沉积法制备金刚石薄膜的工业应用
www.ilib.cn
5.
Progress in Preparation of Thin Film Electrodes for Lithium Ion Batteries by Physical Vapor Deposition
物理气相沉积制备锂离子电池正极薄膜研究进展
www.ilib.cn
6.
Molecular dynamics simulations of physical vapor deposition
薄膜沉积过程的分子动力学模拟
www.ilib.cn
7.
Effects of substrates on silicon oxide nanowires growth by thermal chemical vapor deposition
衬底对化学气相沉积法制备氧化硅纳米线的影响
www.ilib.cn
8.
Preparation of Tin Oxide Self-assembly Nanostructures by Chemical Vapor Deposition
化学气相沉积法制备氧化锡自组装纳米结构
www.ilib.cn
9.
Synthesis of ZnO Nanowires by Catalysts Assistant Chemical Vapor Deposition Method
催化剂辅助化学气相沉积法制备准单晶ZnO纳米线
www.ilib.cn
10.
Infrared Radiation Material Produced by Physical Vapor Deposition
用汽相沉积法制作红外辐射膜材料
www.ilib.cn
1.
Effects of Gas Flow Rate on the Preparation of Multi-walled Carbon Nanotubes Using Chemical Vapor Deposition
气体流量对化学气相沉积法制备碳纳米管的影响
jxhg.nextage.cn
2.
Thermodynamic Prediction on the Preparation of Multiwall Carbon Nanotubes via Chemical Vapor Deposition of Hydrocarbon and CO
烃和CO气相沉积制备多壁碳纳米管的热力学条件
hxgyygc.nextage.cn
3.
Applications of Chemical Vapor Deposition in the Back-End Process of Integrated Circuits Manufacturing
化学气相淀积在集成电路制造后段工艺中的应用
service.ilib.cn
4.
Deposition of Nickel Films by Metal-Organic Chemical Vapor Deposition and Study on the Relevant Factors
镍的金属有机化学气相沉积及相关因素的研究
168.160.184.82:8080
5.
generic specification of low pressure chemical vapor deposition system
低压化学气相淀积设备通用技术条件
www.ichacha.net
6.
Current Situation and Development Trend of Vapor Deposition Technology
气相沉积技术的现状与发展
www.ilib.cn
7.
Influence of discharge current on hot cathode plasma chemical vapor deposition of diamond films
放电电流对热阴极等离子体化学气相沉积金刚石膜影响
ilib.com.cn
8.
Thermodynamic Analysis of Chemical Vapor Deposition Process for ZrC Coating
化学气相沉积法制备ZrC涂层的热力学分析
www.ilib.cn
9.
Super-smooth surface nanometer fabrication of chemical vapor deposition SiC
化学气相沉积SiC材料超光滑表面纳米加工
www.ilib.cn
10.
Plasma-assisted Hot-filament Chemical Vapor Deposition of Diamond Composite Film
等离子体辅助热丝化学气相沉积金刚石复合膜
www.ilib.cn
1.
The theory analysis on residual stress mechanism in film prepared by physical vapor deposition
物理气相沉积薄膜应力产生机理的理论分析
www.ilib.cn
2.
Growth and Properties of TiN Films on Glass by Atmospheric Pressure Chemical Vapor Deposition
TiN镀膜玻璃的常压化学气相沉积法制备及其光电性能研究
www.ilib.cn
3.
Study on Microstructure and Property of TiN Thin Film Layer Obtained by Chemical Vapor Deposition
化学气相沉积TiN薄膜组织性能研究
www.ilib.cn
4.
ZnO Films Synthesized by Solid-Source Chemical Vapor Deposition with c-Axis Parallel to Substrate
固体源化学气相沉积生长c轴平行于衬底的ZnO薄膜
www.ilib.cn
5.
Properties of Silicon Oxynitride Thin Films Prepared by Atmospheric Pressure Chemical Vapor Deposition
常压化学气相沉积法氮氧化硅薄膜性能的研究
ilib.cn
6.
Non-aligned Multi-walled Carbon Nanotubes Produced by Chemical Vapor Deposition
化学沉积法制备无序多壁碳纳米管
www.ilib.cn
7.
oriented growth of diamond film on si via plasma enhanced hot filament chemical vapor deposition
等离子体增强热丝化学气相沉积法生长取向金刚石薄膜
www.ichacha.net
8.
Nano Silicon Carbide Film Prepared by Helicon Wave Plasma Chemical Vapor Deposition
螺旋波等离子体化学气相沉积法制备纳米碳化硅薄膜
jtxb.cn
9.
Effect of Depositing Position on Microstructure of SiC Coating by Chemical Vapor Deposition
沉积位置对化学气相沉积SiC涂层微观组织的影响
www.ilib.cn
10.
Electron Cyclotron Resonance Chemical Vapor Deposition System with Permanent-Magets
永磁电子回旋共振等离子体化学气相沉积系统
www.ilib.cn
1.
Ultralong Single Crystal Silicon Nanowires Synthesized by Chemical Vapor Deposition
超长单晶硅纳米丝的化学气相沉积法制备
www.ilib.cn
2.
Preparation of Shaped Tungsten Product by Chemical Vapor Deposition
化学气相沉积法制取异型钨制品研究
www.ilib.cn
3.
Effect of Methane Concentration on Process of Chemical Vapor Deposition of Diamond Film by Monte Carlo Simulation
蒙特卡罗模拟金刚石薄膜化学气相沉积过程中甲烷浓度的影响
www.ilib.cn
4.
Growth of Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition
微波等离子体化学气相沉积法合成纳米碳管
www.ilib.cn
5.
Research of Complex Coating of Plasma Nitriding and Physical Vapor Deposition TiN
离子氮化与物理气相沉积TiN复合处理研究
ilib.com.cn
6.
plasma enhanced chemical vapor deposition (PECVD)
等离子体增强化学汽相淀积
www.hjenglish.com
7.
Phase formation regularities of Ni-Al alloy nano powders prepared by vapor deposition
气相沉积制备Ni-Al合金纳米粉末的相生成规律
www.ilib.cn
8.
Growth of well- aligned carbon nanotubes arrays by Chemical Vapor Deposition
化学气相沉积法制备定向碳纳米管阵列
wulixb.iphy.ac.cn
9.
Chemical Vapor Deposition of SiC Films and Its Progress
SiC薄膜的化学汽相沉积及其研究进展
ilib.cn
10.
Preparation of Titanium Nitride by Chemical Vapor Deposition
化学气相沉积法制备氮化钛
www.ilib.cn
1.
Fast growth of well-aligned carbon nanotubes by chemical vapor deposition on plain glass
化学气相沉积法快速生长定向纳米碳管
www.ilib.cn
2.
AFM Observation of Fatigue Surface Images of TiN Thin Films by Physical Vapor Deposition
物理气相沉积TiN薄膜疲劳磨损形貌的AFM观测
ilib.cn
3.
Effect of plasma chemical vapor deposition parameters on electron property in Ar plasma
等离子体化学气相沉积参量对Ar等离子体电子特性的影响
service.ilib.cn
4.
Chemical vapor deposition of zirconium carbide coating
碳化锆镀层的化学气相沉积
www.ilib.cn
5.
Chemical Vapor Deposition and Preparation of Materials
化学气相沉积技术与材料制备云南省应用基础研究基金
www.ilib.cn
6.
The Investigation of GaN Films Grown on Si Substrates by Hot-Wall Chemical Vapor Deposition
热壁化学气相沉积Si基GaN晶体膜的研究
www.ilib.cn
7.
Synthesis of Large Area of Aligned Carbon Nanotube by Chemical Vapor Deposition
化学气相沉积法制备大面积定向碳纳米管
www.ilib.cn
8.
Plasma Enhance Chemical Vapor Deposition (PECVD)
电浆增强式化学气相沉积法
www.bing.com
9.
Low Pressure Chemical-vapor-deposition Model and Simulation
低压化学气相淀积的模型及模拟
www.ilib.cn
10.
review of polishing techniques of diamond films grown by chemical vapor deposition
金刚石薄膜抛光技术的研究进展
www.ichacha.net
1.
The Effecting Factors of Adhesion on Physical Vapor Deposition Thin Films
物理气相沉积薄膜附着性的影响因素
service.ilib.cn
2.
Research of ZnO Thin Films Grown by Plasma-enhanced Chemical Vapor Deposition
等离子体增强化学气相沉积制备的ZnO薄膜研究
www.ilib.cn
3.
Physical Vapor Deposition of Tetracene Crystals
并四苯晶体的物理气相沉积
www.ilib.cn
4.
Focused Ion Beam Induced Metalorganic Chemical Vapor Deposition of C-Pt Thin Film
聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜
www.ilib.cn
5.
Advances in chemical vapor deposition for carbon nanotubes
化学气相沉积法制备碳纳米管的研究进展
www.ilib.cn
6.
Interfaces and Adhesion in Physical Vapor Deposition Films
物理气相沉积薄膜的界面与附着力
www.ilib.cn
7.
Platinum Metals Chemical Vapor Deposition
铂族金属化学气相沉积
www.ilib.cn
8.
Advance of Optical Chemical Vapor Deposition Diamond Thin Films
化学气相沉积光学级金刚石薄膜的研究进展
www.ichacha.net
9.
Effect of Preform Geometry on Chemical Liquid-vapor Deposition Process
预制体几何形状对化学液气相沉积工艺的影响
www.ilib.cn
10.
The solidification of materials and vapor deposition
第六章材料的凝固与气相沉积
wenku.baidu.com
1.
New progresses on preparing c-BN films by low pressure vapor deposition methods
几种低压气相沉积技术制备立方氮化硼膜的新进展
www.ilib.cn
2.
Progress of Chemical Vapor Deposition of Precious Metals
贵金属化学气相沉积的研究进展
scholar.ilib.cn
3.
Development of Study on Substrate Materials of Diamond Films by Chemical Vapor Deposition
化学气相沉积金刚石薄膜衬底的研究进展
www.ilib.cn
4.
Handbook of Physical and Chemical Vapor Deposition
物理与化学汽相沉积手册
www.nju.edu.cn
5.
Boat Reactor for Low Pressure Chemical Vapor Deposition
低压化学气相沉积的船型反应器
www.qiyeku.com
6.
Dynamics of Chemical Vapor Deposition of Platinum Film
铂薄膜化学气相沉积动力学规律探讨
www.ilib.cn
7.
Ultra high vacuum chemical vapor deposition system UHV CVD
超高真空化学气相淀积
alading.globalimporter.net
8.
Preparation of Parylene Film by Vapor Deposition
气相沉积法制备聚对二甲苯薄膜
www.ilib.cn
9.
Fgrowing Carbon Buckonions by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition
射频等离子体辅助化学气相沉积方法生长碳纳米洋葱
www.ilib.cn
10.
The Application and Development of Physical Vapor Deposition on Molds
物理气相沉积技术在模具中的应用及发展
service.ilib.cn
1.
The Technics of W-Re Alloy Coating by Chemical Vapor Deposition
化学气相沉积钨铼合金工艺研究
service.ilib.cn
2.
Preparation of Mo-W Alloy by Chemical Vapor Deposition
化学气相沉积制备钼钨合金
www.ilib.cn
3.
Carbon film formed by vacuum vapor deposition
真空气相沉积炭膜
carbon.imr.ac.cn
4.
The Application of Vapor Deposition on the Dies
气相沉积技术在模具上的应用
service.ilib.cn
5.
Matel-organic Chemical Vapor Deposition of Nickel Films
镍的金属有机化学气相沉积
www.ilib.cn
6.
pyrolyzing Fe(CO)_5 vapor deposition, static magnetism;
热解五羰基铁气相沉积;静磁性能;
www.chemyq.com
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