| 单词 | photoresist |
| 释义 | 例句释义: 光致抗蚀剂,光阻,光刻胶,光阻剂 1. When using the sputtering nickel system, photoresist and nickel Crosslinking became extremely easy-to-be strong enough to produce water. 在搁置溅射镀镍的编制洋，平刻胶与镍交联后变得格外坚硬，极易爆发水纹。 www.bing.com 2. Where the UV light shines through, it chemically weakens the photoresist, leaving a pattern on the surface of the silicon. 在紫外光照射穿透的地方，光刻胶的化学特性会被削弱，使硅晶片表面留下图案。 blog.ednchina.com 3. Here are a few solutions: firstly, plasma kinetic dedust, in a high vacuum conditions, oxygen ions and photoresist or chemical reaction. 这边有几个处置方案：第一，等离子不兴尘法，在一个矮真空境况下，氧离子与平刻胶或化学精神反响。 www.bing.com 4. A small undesired hole in an oxide, opaque region of a mask or reticle, or in a photoresist layer. 氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。 www.epcb.org 5. Comparing with all the existing sacrificial layer materials, the photoresist being used as sacrificial layers has some advantages. 同现有的牺牲层材料相比，光致抗蚀剂作牺牲层材料具有一些优越性。 dictsearch.appspot.com 6. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing. 本发明的涂料组合物可用作光致抗蚀剂的覆盖涂层，包括可用在浸渍平版印刷工艺中。 ip.com 7. Otherwise, using photoresist as sacrificial layers does not restrict the thickness of structures and the choice of materials. 此外，用光致抗蚀剂作牺牲材料不影响结构的厚度和材料的选择。 dictsearch.appspot.com 8. A new method with a one wavelength laser for making 3D diffusion objects true color rainbow hologram on the photoresist plate is presented. 提出了一种用单波长激光制作真彩色彩虹全息图的新方法。 www.opticsjournal.net 9. aqueous solution as the developer the photoresist can be of negative tone. 用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形； www.showxiu.com 10. The defining steps of photoresist layer includes exposure and development and the lugs may be joined through stoving to melt. 限定光致抗蚀剂层的步骤还包括曝光、显影。并可利用烘烤步骤使各凸块溶融化，以接合各凸块。 ip.com 1. The invention provides a photosensitive compound having low edge roughness (LER) photoresist pattern. 本发明提供了能形成具有低LER（线边缘粗糙度）的光刻胶图案的感光化合物。 ip.com 2. In microelectronics, the process of removing material, on a chip , left exposed by the exposure and development of the photoresist. 在微电子技术中，通过曝光并显影光刻胶除去芯片上的物质露出剩馀部分的工艺。 dictsearch.appspot.com 3. The said method can obtain certain painting homogeneity and relatively high photoresist utilization. 本发明的方法可在保证一定涂覆均匀度的同时，获得较高的光阻使用率。 ip.com 4. Positive Photoresist is rubber particles upward, the same height and diameter of the rubber. 正胶就是胶皮颗粒向上、高度与直径相等的胶皮。 dictsearch.appspot.com 5. In addition, the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method. 另外，本文还利用时域有限差分法分析了光刻胶层内部的光场分布。 www.opticsjournal.net 6. As photoresist has the exposal characteristics, two-spectrum method is fit for measuring the thickness of photoresist. 针对光刻胶有曝光的特性，双光谱法更适合于胶厚检测。 www.ceps.com.tw 7. Using AZ4620 photoresist throw at plane glass, the measuring thickness of photoresist is benchmark through ellipsometer. 采用AZ4620正型光刻胶甩胶于平面玻璃基片，以椭偏仪测量的结果为基准。 www.showxiu.com 8. A photoresist pattern can be formed on the dielectric. 在该电介质上形成光致抗蚀剂图案； ip.com 9. This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist . 本文介绍了采用302负性光刻胶刻制光学度盘的工艺方法。 dictsearch.appspot.com 10. Study on Process of Water-soluble Printing Photoresist. 水性印花感光制版材料的研究。 www.ctes.com.cn 1. R. 177 so that it can be used for modulation the photoresist. 177进行分散及稳定处理，使其能够适用于光阻剂的调制。 www.lw23.com 2. A novel pressure sensor based on a high-aspect-ratio structure formed by SU-8 photoresist is proposed. 主要提出了一种利用SU-8光刻胶形成高深宽比结构的新型压力传感器。 www.opticsjournal.net 3. Preparation of Antifoaming Agent Used for Developing Semi-Aqueous Dry Film Photoresist 印制线路板显影液用消泡剂的研制 www.ilib.cn 4. Stripping of Photoresist by an Atmospheric Pressure Radio-Frequency Plasma 常压射频低温冷等离子体清洗光刻胶研究 ilib.cn 5. stripping photoresist to obtain the electrode diagram of a diagrammatic all-organic field-effect transistor device; 剥离光刻胶后得到图形化了的全有机场效应晶体管器件的电极图； ip.com 6. Acid Proliferation Generator and Its Application in Chemically Amplified Photoresist 酸增殖源及其在化学增幅抗蚀剂体系中的应用 www.ilib.cn 7. stripping off photoresist with acetone to carry out imaging to a bottom electrode; 用丙酮剥离掉光刻胶对底电极进行图形化； ip.com 8. Calculating the Contrast and Threshold Sensitivity of a Positive Photoresist 计算正性光致抗蚀剂的对比度和阈限灵敏度 www.isres.com 9. forming a hard mask layer and a patterned photoresist layer on the semiconductor substrate; 图案化该光致抗蚀剂层以形成一第一开口； ip.com 10. determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching 测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性 www.ichacha.net 1. Study of Diffractive Field Based Angular Spectrum Theory in Thick Film Photoresist 基于角谱理论的厚层光刻胶衍射光场研究 www.opticsjournal.net 2. A method for processing a photoresist composition, comprises: (a) applying on a substrate a photoresist composition; 本发明涉及一种用于处理光刻胶组合物的方法，它包括：（a）将光刻胶组合物涂覆在基材上； ip.com 3. Preparation and Characterization of Methacrylate Photoresist 甲基丙烯酸酯光刻胶的制备与表征 www.ilib.cn 4. Experimental pretreatment of photoresist emulsified wastewater in the electronic industry 电子工业光致抗蚀剂乳化废水预处理试验研究 www.ilib.cn 5. Enhanced Exposure Model and Its Parameter Measurements for Thick Photoresist 厚层抗蚀剂曝光模型及其参数测量 service.ilib.cn 6. cyclized polyisoprene rubber negative photoresist; ultraviolet negative photoresist 环化聚异戊二烯橡胶负性光刻胶 www.hxen.com 7. Etch Residue Removers and Photoresist Strippers for Semiconductor Cleaning Applications 半导体清洗应用中的刻蚀残渣去除剂和光阻去胶机 www.sichinamag.com 8. Modeling and Simulation of Negative Chemically Amplified Photoresist for Lithography Process 负性化学放大胶的光刻模型及模拟 www.ilib.cn 9. and to determine adequate measures of photoresist performance for quality control purposes 它也被用来测定光阻材料在质量控制方面的效力。 zhidao.baidu.com 10. Key technique of photoresist through-mask Electrochemical micromachining 光刻胶掩膜微细电化学加工参数的试验研究 www.ilib.cn 1. The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms 光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响 www.ilib.cn 2. Measurement of Profile Parameters of Holographic Photoresist Grating Mask Made on Top of Chrome Stack in Spectroscopic Way 镀铬基片全息光栅光刻胶掩模槽形参量光谱检测方法 www.opticsjournal.net 3. using thick photoresist as metal graph protection layer in etching time to carry out photo etching for thick metal layers; 第二步，采用厚的光刻胶作为刻蚀时的金属图形保护层对厚金属层进行光刻； www.bing.com 4. Photoacid generator used in the chemical amplified photoresist--the method of synthesization of sulfonium salts 化学增幅抗蚀剂用光产酸剂--硫鎓盐的合成方法 www.ilib.cn 5. exposing the photoresist film for a plurality of times from various angles; 从多个不同的角度多次曝光该光致抗蚀剂膜； ip.com 6. A Study on the Properties and Imaging Behavior of Highly Branched Alcali-soluble Polyacrylate Photoresist 高支化碱溶性丙烯酸化聚酯光刻胶的性能及成像性研究 service.ilib.cn 7. Simulating Standing-wave Effect in Photoresist with Optical Transmission Matrix 用光学传输矩阵模拟光致抗蚀剂中的驻波效应 www.ilib.cn 8. Application of Alkali Soluble Photosensitive Resin for Photoresist 碱溶性光敏树脂在光致抗蚀剂中的应用 www.ilib.cn 9. A New-style Positive Photoresist Lift-off Techniques and Its Application 一种新型的正胶剥离技术及其应用 www.ilib.cn 10. Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings 一种控制矩形光刻胶光栅槽深和占宽比的方法 210.72.9.40 1. Fabrication Technology of Microlens Array by Melting Photoresist 微透镜阵列的光刻胶热熔制作技术 service.ilib.cn 2. Evolvement model of photoresist spin coating thickness on spherical surface 球面旋涂光刻胶膜厚分布的数学模型 www.ilib.cn 3. Preparation and application of new liquid photoresist 新型液态光致抗蚀剂 www.ilib.cn 4. Batch Spray Processing for Superior Photoresist Stripping and Film Removal 喷雾清洗平台优化光阻剥离和薄膜去除工艺 www.sichinamag.com 5. forming a photoresist film above the interlayer dielectric layer; 在该层间介电层上方形成光致抗蚀剂膜； ip.com 6. Research progress and application status of UV positive photoresist 紫外正性光致抗蚀剂的研究进展及应用现状 ilib.com.cn 7. Research and application of thick photoresist lithography using UV light 紫外线厚胶光刻技术研究及应用 www.ilib.cn 8. Introduction of photoresist coating process 涂光刻胶工序介绍 wenku.baidu.com 9. Research Development on Water-Soluble Photoresist 水溶性光致抗蚀剂研究进展 www.ilib.cn 10. Ashing Photoresist Using an Atmospheric Pressure RF-Excited Cold Plasma 常压射频激励低温冷等离子体刻蚀光刻胶 ilib.cn 1. carries on exposing treatment stage by the photo mask on the photoresist; 在光刻胶上利用光掩膜进行曝光处理的阶段； ip.com 2. Synthesis and photoresist behaviors of highly branched arcylated polyesters 高支化碱溶性聚酯的合成及光成像研究 www.ilib.cn 3. A New Method to Fabricate Attenuated Phase-shifting Mask with Photoresist Shifter 用光致抗蚀剂膜层制作衰减相移掩模 service.ilib.cn 4. Auxiliary reagent for negative photoresist 负性胶配套试剂 www.hxen.com 5. Research Status of Ultraviolet Photoresist 紫外光致抗蚀剂的研究现状 168.160.184.78 6. forming a linear photoresist pattern on the osmium membrane surface; 在锇膜表面形成线形的光刻胶图案； ip.com 7. Study on Thickness of the Photoresist Film in Incline-dip Coating 基于斜拉涂胶法光学胶膜厚度的精确模型 www.ilib.cn 8. Progress in the Research of Chemical Amplified Photoresist 化学放大光刻胶高分子材料研究进展 service.ilib.cn 9. Fabrication of micro-structure by using epoxy-based negative photoresist 环氧基负性光刻胶加工微结构的试验研究 www.ilib.cn 10. Applications and Syntheses of Polyhydroxystyrene in Deep UV Photoresist 聚羟基苯乙烯在光致抗蚀剂中的应用及其合成 www.ilib.cn 1. Studies on a Novel Deep UV Positive Photoresist Material 一种新型深紫外正型光致抗蚀剂材料的研究 www.ilib.cn 2. Application Performance of Photoresist in IC Field 浅谈光刻胶在集成电路制造中的应用性能 www.ilib.cn 3. Application of Photoresist Etching and Plating Ink 光成像抗蚀抗电镀油墨的应用工艺 www.ilib.cn 4. METHOD FOR STRIPPING PHOTORESIST FROM ETCHED WAFER 由蚀刻圆片剥离光刻胶的方法 blog.sina.com.cn 5. The Preparation and Properties of a Kind of Sulfonium Salt PAG Applicable for 193 nm Photoresist 一种适用于193nm光刻胶的硫鎓盐光产酸剂的制备与性质 www.ilib.cn 6. forming a first hard mask pattern by etching the third hard mask layer using the photoresist pattern as an etching mask; 使用该光刻胶图案作为蚀刻掩模对该第三硬掩模层进行蚀刻，形成一第一硬掩模图案； www.showxiu.com 7. Three-dimension photonic crystals fabrication using SU-8 photoresist SU-8光刻胶制作三维光子晶体 www.ilib.cn 8. jetting photoresist onto the substrate with nozzle; 利用喷嘴将光阻喷射至基板上； ip.com 9. Study on the properties of photoresist baking process 光刻胶烘培特性研究 www.ilib.cn 10. Molds for nanoimprinting made by modified photoresist 改性光刻胶制备纳米压印模版 www.ilib.cn 1. It is then to form photoresist layer on the thin film transistor, data line, scanning line and cross area; 形成一光致抗蚀剂层于该薄膜晶体管、该数据线、该扫描线及该交错区之上； ip.com 2. dry photoresist for silk screen printing 锡化丝印干膜 www.enread.com 3. Study on dimensional precision of UV-lithography on SU-8 photoresist SU-8胶紫外光刻的尺寸精度研究 168.160.184.78 4. A new dry process for photoresist removal 去除光刻胶的新干法工艺 www.ilib.cn 5. The Study on the Photolithographic Effect of Using Polysilane As Photoresist for Uv Submicron Photolithography 聚硅烷用作紫外亚微米光刻胶 www.ilib.cn 6. Study on Deep Reactive Ion Etching of SU-8 Photoresist SU-8光刻胶氧刻蚀的研究 www.ilib.cn 7. Research of Microneedle Actuator Based on SU-8 Photoresist 基于SU-8胶的微针执行器的研制 www.ilib.cn |
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