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单词 polishing pad
释义

polishing pad

  • 网络抛光垫片;贴在研磨垫;研磨片
1.
抛光垫片
互助组的朋友们注意啦- - 阿里巴巴商人论坛 ... 欧泊 pal 抛光垫片 polishing pad 配链 accessory lace ...
club.china.alibaba.com
2.
贴在研磨垫
...进行 机械加工是将晶圆放置在研磨机内 将加工面压 贴在研磨垫(Polishing Pad)磨擦 并同时滴入具腐蚀性的化学溶剂当研磨液 …
www.docin.com
3.
研磨片
研磨片 (Polishing Pad)半导体化学机械研磨制程 (CMP) 矽晶圆,蓝宝石晶圆研磨制程 (Si & Sapphire Wafer) 玻璃与彩色滤光片 …
www.sumitronics.com.tw
4.
抛光皮
LAPSPEED 秉晨企业有限公司 ... 液态钻石研磨剂 Liquid diamond 抛光皮 Polishing pad 研磨盘 Lapping plate ...
lapspeed.com.tw

例句

释义:
1.
Different densities of the polishing elements may be positioned within different areas of the surface of the polishing pad.
可将不同密度的抛光单元定位在抛光垫表面的不同区域内。
ip.com
2.
A polishing pad includes polishing elements interdigitated with one another over a surface of the polishing pad.
一种抛光垫,包括在抛光垫表面上方彼此交叉的抛光单元。
ip.com
3.
The invention relates to a conductive polishing pad and a manufacturing method thereof.
本发明涉及一种可导电的抛光垫及其制造方法。
ip.com
4.
Besides, the cleaning device can prevent a wafer from scratching and can also prolong the service life of the polishing pad.
此外,可以防止晶片刮伤,并且还可以延长抛光垫的寿命。
ip.com
5.
A chemical mechanical polishing pad comprising a water-insoluble matrix which comprises (A) a styrene polymer and (B) a diene polymer.
一种化学机械抛光垫,包含由(A)苯乙烯聚合物和(B)二烯聚合物构成的非水溶性基质。
www.1168818.cn
6.
In addition, a method of forming the polishing pad and a method of polishing a surface with the polishing pad is disclosed.
另外,本发明还公开了形成抛光垫的方法以及用抛光垫抛光表面的方法。
ip.com
7.
A polishing pad has a polishing layer having a polishing surface with a surface roughness between about 200 and 300 microinches.
本发明公开了一种包含抛光层的抛光垫,所述抛光层具有表面粗糙度介于约200至300微英寸间的抛光表面。
ip.com
8.
Preventing dry buffing is made simply with Chemical Guys POLISHING PAD LUBE & CONDITIONER.
预防乾抛光是纯粹与化学傢伙软磨片润滑油及空调器。
www.autodetail.cc
9.
If you've got lighter defects, then use a White LC polishing pad or a Black LC finishing pad.
如果缺陷比较轻,使用LC白色抛光棉或是黑色镜面棉。
13hy.com
10.
Polishing pad material: Suitable for all kinds of polishing materials.
抛光垫材料:适用于各种抛光模材料。
product.ch.gongchang.com
1.
The invention relates to a polishing pad with abrasive grains and a manufacturing method thereof;
本发明涉及一种具有研磨粒的抛光垫及其制造方法。
ip.com
2.
Study on Removing Function of the Polishing Pad of Dual-Rotator Mechanism
双转子研抛模去除函数的研究
ilib.cn
3.
polyurethane waxless polishing pad; waxless polishing pad
聚氨酯无蜡抛光软垫
www.foodmate.net
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更新时间:2025/8/16 19:20:01