on a substrate

The disclosure relates to a method for depositing films on a substrate which may form part of an LED or other types of display.

The invention is directed to a resistive memory cell on a substrate and a resistive memory array.

Electroplating is an electrochemical process by which metal is deposited on a substrate by passing a current through the bath.

Researchers are building the surfaces out of metallic materials on a substrate.

The invention utilizes spherical nano-photocatalyst and non-spherical photocatalytic sol for coating a photocatalyst layer on a substrate.

This yields greater uniformity of the coating on a substrate to be coated.

A non-wetting monolayer can be deposited easily and accurately in desired regions on a substrate.

A first layer of nanostructured support elements is formed by depositing a base material on a substrate and annealing.

In the method, a metal interconnection can be formed on a substrate.

The printing ink is printed on a substrate to form the phase difference film required by three-dimensional display.

In certain embodiments a method of forming an ultra shallow junction on a substrate is provided.

This uses complex and expensive machinery to build up atomic layers of material on a substrate.

Water requirement on a substrate depends on species, and typically varies between 71 and 94%.

A method for forming an ultra shallow junction on a substrate is provided.

A method of depositing a silicon and nitrogen containing film on a substrate.

The temperature profile in the molten layer of a thin-film coated on a substrate induced by irradiation with a pulsed laser

The liquid crystal display device is provided. The liquid crystal display device includes a gate line and a data line formed on a substrate;

Provided are a method of horizontally growing carbon nanotubes . The method includes: depositing an aluminum layer on a substrate;

Measurement of complex permittivity and permeability in dielectric materials placed on a substrate using waveguide method

A method for processing a photoresist composition, comprises: (a) applying on a substrate a photoresist composition;

Particularly, the method for forming the semiconductor transistor comprises the steps of: printing a grid on a substrate;

A semiconductor device includes first layer wiring including a gate electrode mounted on a substrate;

The thin-film transistor includes: a gate electrode formed on a substrate;