magnetron

The next morning, Scientist Spencer decided to put the magnetron tube near an egg.

Spencer continued to experiment with the magnetron until he boxed it in and marketed it as a new way to cook food.

The invention relates to a magnetic confinement magnetron sputtering method and a magnetron sputtering device prepared by use of the same.

When he places popcorn kernels in front of the magnetron, the kernels explode all over the lab.

The self-proclaimed engineer noticed that the chocolate bar had melted when he was working with the magnetron.

The result of research showed that the a-C: F film was amorphous structure by magnetron sputtering.

The coating glass with excellent properties can be prepared by heat evaporate technique or magnetron sputtering technique.

High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at room temperature.

The magnetron tube had to be water-cooled, so plumbing installations were also required.

A magnetron sputtering apparatus and a method for manufacturing thin film are provided.

the top of the radiating cylinder is a toughening glass window for isolating water with the magnetron.

In magnetron sputtering, higher deposition rate could be helpful to deposit metal films of higher purity within shorter deposition time.

All coatings were prepared by hybrid physical vapor deposition processes, combining magnetron sputtering and pulsed laser deposition.

With utilizing magnetron control technology, the cladding welding quality the stability of cladding welding process are improved.

and a heat-cooking chamber fed with microwaves radiated from the magnetron.

The FM system is used for changing the oscillating frequency of the magnetron.

Repair Engineer: Oh, my God! I got it! The magnetron is out of order.

Indium-tin oxide (ITO) films were prepared by reactive magnetron sputtering on polymer matrix composites substrates.

The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.

The invention provides a rectangular target with high target utilization ratio, which is used for magnetron sputtering metal films.

and a high voltage transformer and a magnetron are arranged in the high temperature zone.

Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering.

Thin Film thickness monitoring in thermal, e-beam, sputtering, magnetron, ion and laser deposition.

In this paper, we study the magnetron cavity used in atomic hydrogen maser.

Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering.

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

However the film deposited by R. F magnetron sputtering has better uniformity and compactness.

The SiCN thin films are prepared by twined charge chamber microwave ECR plasma enhanced unbalanced magnetron sputtering system.

All these multilayers are deposited by magnetron sputtering method on microcrystalline glass substrates.

A novel method to drive magnetron by constant voltage-constant current technique is proposed.

Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.

In recent years, the relativistic magnetron with diffraction output (MDO) has been studied rapidly.

Its principle and some other related aspects are briefly described, including the magnetron sputter coater and the osmium plasma coater.

The filament circuit can provide DC filament voltage for the magnetron.

There are many methods to prepare the dielectric thin films, which mainly are Sol-Gel, MBE, PLD, RF magnetron sputtering, etc.

Figure 12: High-power multi-cavity magnetron ( cutaway view ). Photo: Radar System fundamentals.

The experimental condition of DC magnetron sputtering for ZMO films with good optical and electric properties has been established.

Various Pd films prepared on glass substrates by magnetron sputtering in vacuum or O2 ambience were used as catalysts.

Si rich SiO2 films have been prepared by a rf magnetron sputter method.

Photocatalytic Ag-TiO2 thin films prepared by RF magnetron co-sputtering were studied in the fourth chapter.

The present invention discloses a conductor structure of magnetron, belonging to circuit device of magnetron.

There is a cooling chamber with inlet and outlet for cooling medium inside magnetron targets.

With the development of magnetron sputtering technology, large area glass of optical multilayer also made its progress gradually.

Fix for targeting units under the influence of world forces (ie Magnetron).

They paid specialattention to raising the quality of magnetron and multicavity klystron.

Based on this idea, we propose a model of magnetron photonic switching circuit and make it successful theoretic.

You must help Magnetron arrange a series of metal balls in a specific pattern.

Binder is used to coat on the fabric that is prepared by DC magnetron sputtering to improve the combine fastness of aluminum layer.

In the third chapter Sb-doped TiO2 thin films prepared by DC reactive magnetron sputtering were studied.

This is achieved by DC magnetron co-sputtering of amorphous silicon and carbon to form a SiC thin film onto a surface, such as a solar cell.

Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

Study of the discharge characteristic of an unbalanced magnetron sputtering system with an axial solenoid

Study of the Wear Resistance of Titanium Alloy Subject to Complex Surface Treatment by Micro-Arc Oxidation and Magnetron Sputtering

Experiment and Design for Reducing the front Time Jitter of Coaxial Magnetron

Study of the Glass Thin-film Optical Waveguides Deposited by the Reaction Magnetron Sputtering

Poisoning Phenomenon on the Surface of ITO Target During DC-Magnetron Sputtering Process

The NiAl Nanometer Grain Coating by an Radio Frequency Magnetron Sputtering System

Design of the General Automatic Magnetron Ager for Terminal Guidance Radar

With the Help of a Synchro, Realizing the Compatibility of Both Frequency Hopping and Frequency Agility of Magnetron

The invention discloses a washings processing unit, which includes a rotatable rotator frame provided with a rotator magnetron;

Plating metal film on the surface of particles using magnetron sputtering method

Argon Plasma Generated by DC Glow and Magnetron Assisted Discharge: a Study of Spatial Resolved Optical Emission Spectroscopy

Preparation and Tribological Characteristics of the CrN Films Deposited with Unbalanced Magnetron Sputtering Technique

Application and Study of the Closed Field Unbalanced Magnetron Sputter Ion Plating on Router for PCB

Preparation of High Quality Cubic Boron Nitride Film by Radio Frequency Magnetron Sputtering and Its Characterization

Study of Transparent Conducing ZnO: Ga Films Deposited on Polyimide Substrate by RF Magnetron Sputtering

Study of Cu film deposited by high density plasma enhanced nonequilibrium magnetron sputtering

Simulation and calculation of electromagnetic field distribution and movement of charged particles during magnetron sputtering

XPS study of fluorinated diamond-like carbon films prepared by reactive magnetron sputtering

Quantitative Analysis of Reliability and Allotment For Spare Parts of Missile Magnetron

Analysis and Numerical Calculation of a Double Anode Magnetron Injection Gun for Gyrotron

In Vitro bacterial adhesion properties of radiofrequency magnetron sputtered hydroxyapatite coating

Study of DLC films residual stress by unbalanced magnetron sputtering technology

Solid Particle Erosion Protection of Turbine Blades with Thick Nitride and Nanocomposite Coatings from Magnetron Sputter Deposition

Influence of applied magnetic field on the magnetron sputtering and physical characteristics of the deposited films

Effect of the substrate temperature on the structural and optical properties of ZnO films deposited by reactive magnetron sputtering

Study of ZnO film growth by reactive magnetron sputtering using plasma emission spectra

Preparation and Characteristics of Glass Thin-film for Optical Waveguides Deposited by the Magnetron Sputtering

The invention relates to a magnetron, comprising: an anode and cathode for generating microwave;

Relationship between target-substrate distance and thickness uniformity of films deposited by magnetron sputtering

Preparation of hydroxyapatite coating deposited on the titanium alloy surface with magnetron sputtering technique

Influence of Technological Parameters on Optoelectronic Properties of ZAO Films Deposited by DC Magnetron Sputtering Method

Technology Study of Cu Underlayer Prepared by Magnetron-sputtering

Preparation and characterization of gold nanoparticles by magnetron sputtering technique

Tribological Properties of Graphite-Like Carbon Coating Prepared by Unbalanced Magnetron Sputtering Method

Vanadium oxide thin films as the cathode in lithium micro-battery prepared by RF magnetron sputtering technology

Study of Silver Oxide Film Prepared by Magnetron-controlled Sputtering

Technological study on ZrN decorative thin films deposited by Medium-frequency reactive magnetron sputtering process

Preparation and characterization of DLC films by microwave ECR plasma source enhanced unbalance magnetron sputtering

The Microstructure and Analysis of Graphite-like Carbon Film Deposited by Unbalanced Magnetron Sputtering Technique

Electromagnetic Shielding Fabrics with Magnetron Sputtered Copper Coating

Study of the film deposition ratio by magnetron sputtering

Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system

Influence of Technological Factors on Electrical and Optical Properties of ITO Films Deposited by DC Magnetron Sputtering Method

Morphology and Physical Properties of Titanium Nitride Films Deposited by Magnetron Sputtering at Room Temperature

Fabrication and Characterization of Magnetron Sputtered Nanostructured Ag Films

Effect of Technical Parameters on Deposition Rate of AlN Films Prepared by Magnetron Reactive Sputtering

Characteristic Comparison of Coating Metal on Cenospheres by Chemical Method and Magnetron Sputtering Method

Study on beam characteristics of a double anode magnetron injection gun

Study on nucleation and dynamic scaling of morphological evolution of ZnO film deposition by reactive magnetron sputtering

ZnO Nanorods Prepared by Magnetron Sputtering and Thermal Oxidation and Their Photoluminescence

RF magnetron sputtering of GaP thin film and computer simulation of its depositing process

a stator arranged on the inner side of the rotator frame to apply electromagnetic force to the rotator magnetron;

Phase Compositions and Resistance-Temperature Characteristic of VOx Thin Films by Magnetron Sputtering

Structure Characterization of Vanadium Oxide Thin Films Prepared by Magnetron Sputtering Methods

Microstructures and Properties of Titanium Nitride Film Grown by Unbalanced Magnetron Sputtering

Piezoresistance Characteristics of Ytterbium Thin Film Grown by Magnetron Sputtering

Growth of Electromagnetic Shielding Multilayer by Magnetron Sputtering for Plastic Chassis

Study on the thickness uniformity of films deposited by magnetron sputtering or unbalanced magnetron sputtering

Influence of Annealing on the Optical and Electrical Properties of ITO Films Prepared by Direct Current Magnetron Sputtering

Analysis and study on the capability of aluminium films prepared by electron beam vapour deposition and magnetron sputtering

Investigation of utilization ratio and calculating method of familiar magnetron sputtering targets

Development of Tungsten Carbide Film Preparation by Magnetron Sputtering and its Application

Study of Nanomechanical Properties and Nanotribological Behavior of BCN Films Deposited by Magnetron Sputtering

Synthesis of ZnO Nanoparticles by Magnetron Sputtering and Subsequent Thermal Oxidization

The microstructure and electrical properties of Ta-N films synthesized by unbalanced magnetron sputtering

Preparation and Characterization of Nanocrystalline Ni-Mo as Cathode Catalyst via RF Magnetron Sputtering

Preparation of Silicon Thin Films on Glass Surface Using Microwave ECR Plasma Source Enhanced Magnetron Sputtering

Application of magnetron sputtering plant with three cylindrical targets to decoration coating

Research on Low Temperature Plasma Annealing of Indium Tin Oxide Films Prepared by Direct Current Magnetron Sputtering

Fabrication and characterization of nano-titanium dioxide thin films by magnetron sputtering method

Preparation and Characterization of Metal-coated Micro-particles by Magnetron Sputtering

Influence of Technological Parameters on Binding Ability of Stainless Steel Film by Magnetron Sputtering

Sectional specification for permanent ferrite magnets for microwave oven magnetron

The Microstructure and Mechanical Properties of Ti-Si-N Nanocomposite Coating Prepared by DC Magnetron Sputtering

ZnO Nanorods Synthesized Through Thermal Oxidation of Metal Zinc Thin Film Deposited by Magnetron Sputtering

Film Thickness Distribution Simulation of Planar Magnetron Sputtering

Optimization of the tunable bandwidth of agile relativistic magnetron

Technology Study of AZO Thin Films Made by Magnetron Sputtering

Influence of the working gas pressure on the deposition rate in magnetron sputtering for thin coating

Simulation and Development of a Low Cost, High-Efficiency Microwave Oven Magnetron

Study of ZAO thin films process parameter by RF magnetron sputtering

Growth of p-Type ZnO Films by DC Reactive Magnetron Sputtering and Its Characteristics

Study of Effects on Adhesion of Cr Films Deposited by D. C Magnetron Sputtering

Research Status and Prospect of Hydroxyapatite Thin Film Synthesized by Magnetron Sputtering

Textured ZnO Transparent Conductive Thin Film Prepared by Mid-Frequency Magnetron Sputtering

Control of the Magnetic Film Composition and Uniformity in Magnetron Sputtering

Technological and Magnetic Study of SmCo Thin Films Prepared by Magnetron Sputtering

Effect of Ar's Pressure on Microstructure and Conductivity of Nano-structured Silver Films Deposited on PET by Magnetron Sputtering

Investigation of diamond-like-carbon films prepared by unbalanced magnetron sputtering

Modeling analysis of gradient-index coatings prepared by reactive magnetron sputtering

Multi-layer Compound Coating on Cast Iron Piston Ring by Multi-arc and Magnetron Sputtering Ion Compound Plating Technique

ZrN films deposited by the technology of mid-frequency reactive magnetron sputtering

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process

Design on Rectangular Planar Magnetron Sputtering Target Without Shielding Cover

Applications of Magnetron Sputtering on Magnesium Alloys Surface Treatment

Structure and Properties of Graphite-like Carbon by Ion Beam Assisted Magnetron Sputtering Deposition

Influence of External Magnetic Field on Utilization Ratio of Target Materials in Magnetron Sputtering

Technological study on Ni thin film thermistor as temperature sensor during magnetron sputtering

Microstructure Study of Magnetron-Sputtered Indium Using EBSP Method

Design and implementation of a high-precision magnetron heater

Deposition of Aluminum oxides films by medium frequency reactive magnetron sputtering

Application of Multiple Metal Coating of Closed Field Unbalanced Magnetron Sputter Ion Plating in PCB Micro-drill

Influences of the Process on Thickness Uniformity of Films Deposited by Magnetron Sputtering

Helium-charged aluminium films deposited by direct current magnetron sputtering

Application of Closed Field-unbalanced Magnetron Sputtering in Optical Coatings

Diagnosis of unbalanced magnetron sputtering of dual target system by a plane plate probe

Developing of alternative current pulsed magnetron sputtering cathode's power supply

Properties of diamond-like carbon films deposited by unbalanced magnetron sputtering

Influences of Substrate Temperature on Properties of ZGO Thin Films Prepared by Middle-frequency Alternative Magnetron Sputtering

Relationship between Internal Pressure of Vacuum Tube and Ionic Current of Magnetron Discharge

Deposition of TiAlN film by reactive magnetron co-sputtering and related mechanical properties

Investigation on Cr-doped diamond-like carbon films prepared by mid-frequency dual-magnetron sputtering

Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering

AlN Piezoelectric Thin Film Prepared by Reactive Magnetron Reactive Sputtering

Effect of Pulse Bias Voltage on Adhesive Strength of Magnetron Sputtering Ion Plated Al Coating on Depleted Uranium Surface

Relationship between plating and magnetron sputtering for metallic films

Effect of bias voltage on morphology and performance of magnetron sputter ion plating graphite-like carbon coatings

Properties of Diamond Like Carbon Films Prepared by Unbalanced Magnetron Sputtering

Calibrating method of magnetron sputtering materials deposition rate

The structure and hydrogen storage characteristic of magnetron sputtering Ti-base alloy films

The Properties of DLC Hard Film Prepared by Combining Unbalanced Magnetron Sputtering with Arc Plating

Study on Optical and Electrical Properties of ITO Thin Films Deposited by DC Reactive Magnetron Sputtering

Study of tantalum plating by magnetron sputtering and it's coating characteristic

Reliability of Semiconductor Laser with RF Magnetron Sputtering Facet Coating

Synthesis of One-Dimensional ZnO Nanorods by Oxidating Zinc Films Deposited with Magnetron Sputtering

Magnetron sputtering target source and sputtering procedure

Effect of Substrate Temperature on the Composition of AIN Thin Films Prepared by DC Reactive Magnetron Sputtering

Transparent conducting ZnO films prepared on organic substrate by r. F. Magnetron-sputtering

Magnetron Sputtering Tantalum Film Technology for Titanium-Coated Anode

New kind of energy-output impedance convertor of magnetron

Analysis of Factors Affecting Relativistic Magnetron's Efficiency

Preparation and Characterization of Nitrogen Doped ZnO Films by RF Magnetron Sputtering

Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering

The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams

Plasma Extraction in Magnetron Sputtering with Open Confining Magnetic Field

Preparation of inert anode in aluminium electrolysis by magnetron sputtering

Effect of ion bombardment on fracture toughness of Cr-N coatings deposited by ion beam assisted magnetron sputtering

The Simulation Research on Medium-frequency Power Supply for Magnetron Sputtering

Thick Diamond-like Carbon Film Deposited Using Mid-frequency Magnetron Sputtering

Green Photoluminescence Emitted from ZnO Films Deposited by r. F. Magnetron Sputtering

Preparation nanometer Si clusters by RF magnetron sputtering technique

Preferential orientation AlN films by RE reactive magnetron sputtering

The Recent Developments and Applications of Magnetron Sputtering

Thermodynamic discussion on the growth of carbon nitride film by magnetron sputtering

Model and equipment researches on foam transmission in production process of magnetron sputtering foam Ni

Effect of Substrate Temperature on Performance of ZAO Thin Films Deposited by Magnetron Sputtering

Study on Magnetron Sputtering Thin Film TiN and Intellectualizing Liquid Level Sensor

Photoluminescence centers and shift of ZnO films deposited by rf magnetron sputtering

Microstructures and Properties of Tantalum Film Grown by DC Magnetron Sputtering

Fabrication of Thin Film on Stainless Steel Using Magnetron Sputtering Technique

Structure and Properties of Cr-Cu-N Composite Films Prepared by Ion Beam Assisted Magnetron Sputtering

Analysis of the Magnetic Field in the End Region of the Rectangular Planar DC Magnetron Sputtering Apparatus

Properties and conductivity mechanism of ITO films prepared by r. F. Magnetron sputtering

Optimizing Gas Parameters of Low-resistance ITO Films Prepared by DC Magnetron Sputtering

studies of vanadium pentoxide thin films prepared by r . f . magnetron sputtering methods

Study on the crystallization characteristic of Ge thin films by magnetron sputtering

Oxidation Resistance of Magnetron Reactive Sputtering CrN Films

Copper nitride thin films prepared by radio frequency magnetron sputtering

Fabrication and Properties of PZT Ferroelectric Thin Film by RF Magnetron Sputtering

The optoelectronic properties of SiC films deposited by RF magnetron sputtering

Effect of Perpendicular Magnetic Field on Properties of Fe-N Films Grown by Reactive Magnetron Sputtering

The trajectories of electrons in a DC cylindrical magnetron

Analysis of the structure of fluorinated diamond-like carbon films prepared by reactive magnetron sputtering

The Effect of Process Parameters on Plasma Environment of RF Magnetron Sputtering PTFE Target With Negative Pulse- Voltage Bias

Study on Surface Evolution of Cu Thin Films Deposited by Magnetron Sputtering Technology

Characteristic Comparison of ZnO Thin Film Prepared by Sol-gel Method and R. F. Magnetron Sputtering

Silicon Nitride Thin Films Prepared by Magnetron Reaction Sputtering

Computer Simulation of Ion Transportation in RF Magnetron Sputtering

Properties of ZAO Films Prepared by Non-reactive DC Magnetron Sputtering at Room Temperature

Analysis on the films of SiGe heterostructure prepared by magnetron sputtering

Analysis of Orthogonal Experiments on ITO Films Prepared by DC Magnetron Sputtering

Metallization of SMD Inductor of Ferrite Ceramics by Magnetron Sputtering

Plating Metals on Cenosphere Particles by Magnetron Sputtering

Research of Unbalanced Magnetron Sputtering System

Research on Magnetron Sputtering Winding Coating Equipment for Use in Plastic ITO Films

Optical Properties of ITO Films Prepared by RF Magnetron Sputtering at Room Temperature

Effect of Current Field Intensity on Performance of ZAO Thin Films Deposited by DC Magnetron Sputtering

Study on the Microstructure of Uranium Films Produced by Magnetron Sputtering

On the Technological Parameters Deposition of Al Thin Films by DC Magnetron Sputtering

Preparation of AlN Films by Middle Frequency Pulsed Magnetron Sputtering

Optimizing target design in magnetron sputtering deposition of thin film

Effect of Substrate Surface Appearance on the Adhesion of Cr Films Deposited by D. C Magnetron Sputtering

Plasma emission spectra in process of AlN thin films deposition by reactive magnetron sputtering

Designs and Discussions on the Coaxial Magnetron Working at Narrow Pulse Duration

Uniform measurement of film thickness by magnetron sputtering

Effect of Process Parameters on the Properties of Al-doped ZnO Thin Film Prepared by RF Magnetron Sputtering

Simulative calculation of magnetron injection gun in an mm-wave gyro-klytron

Application of DC Magnetron Sputtering Coating in the Glass Coating Technique

Effect of Oxygen Partial Pressure on the Properties of ZAO Thin Film Prepared by DC Magnetron Sputtering

The Improvement of Magnetron Sputtering Technique

Two pairs of unbalanced magnetron sputtering sources are available

Electronic Properties of SiC Films Deposited by RF Magnetron Sputtering

Study on frequency deviation by magnetron sputtering thin film on quartz crystal

Structural and Electrical Properties of ZnO Thin Film by DC Magnetron Sputtering

Photoluminescence of SiC Film Formed by Magnetron Sputtering

Luminescence Properties of ZnO Films Prepared by r. F. Magnetron Sputtering

Surface acoustic wave properties of ZnO films grown by magnetron sputtering

Preparation of Ti Alloy Films Containing He by Magnetron Sputtering Method and Thermodesorption Research for He in the Films

Argon Flux Effect on the Preparation of Vanadium Oxide Thin Films by DC Magnetron Sputtering Method