Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporationdeposition.
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。
2
The method can be used not only for vacuum evaporationdeposition, but also for sputtering deposition to prepare the thin-film.
它 既能用于真空蒸发沉积，又可用于溅射沉积来制备薄膜。
3
The basic principles, deposition systems and laser sources of pulsed laser evaporationdeposition (PLED) and laser-induced chemical vapor deposition (LCVD) are simply introduce.