The feasibility of using traditional dry-etch BARCs is very questionable because they introduce more process complexity and more defectivity and potentially cause unnecessary substrate damage.
传统的干法刻蚀不适合用于注入层,因为它的工艺复杂而且在刻蚀过程中可能导致基片损坏。
2
Based on ash chamber of metal etch this paper describes the full process of dry clean development and evaluation.
本文以金属刻蚀去胶腔为背景,简述干刻清洗工艺开发和评价过程。
3
An epitaxial deposition process including a dryetch process, followed by an epitaxial deposition process is disclosed.