A simple dynamic chemical etchingdevice based on siphon principle is developed for fabrication of optical fiber probes which are commonly used in near-field optical microscopy.
基于虹吸原理,设计了一种动态化学腐蚀法的简易装置,用于制备近场光学显微镜光纤探针。
2
The device USES a deep etching with a shallow etching to shield the "static mirror" effect.
该器件采用一次深刻蚀与一次浅刻蚀,从而屏蔽掉“静态镜面”的影响。
3
After etching the surface of GaAs chip could be smooth and the isolation grooves have little edges, which can completely meet the requirements of device design.