All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extremeultravioletlithography (EUVL).
由于材料的吸收和低折射率问题,极紫外光刻所采用的光学系统发展趋势是全反射型。
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A new design of off-axis five mirrors optics was presented which was used to extreme-ultravioletlithography. It was very suit for the commercialization at optical quality and free work distance.