The reliability of strain silicon, gate dielectric and copper interconnection are discussed, and some new researches are presented.
简介了应变硅材料、栅介质的工艺及铜互连的可靠性，并对新的研究方向做了介绍。
2
The piezoelectric strain coefficient and the dielectric constant of PVDF films increased, and the dielectric loss decreased with the increasing of the polarization field.