The fabrication process is carefully controlled so that the gratinggroove and multilayer-coating parameters well meet the design targets.
由于对离子束刻蚀工艺和镀膜工艺的精细控制，光栅的槽形参数及多层膜参数良好地满足了设计要求。
2
The method is qualified for measurement of groove depth and duty cycle simultaneously for the rectangle-shaped or similar profile of holographic grating mask.
对于要求同时检测矩形或接近矩形槽形的全息光刻胶光栅掩模的槽深和占宽比，该方法完全适用。
3
The transmission angle is controlled by grating frequency and the diffraction efficiency is controlled by groove depth of sub-micro gratings to get uniformity of transmission filed.