The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
2
Essay brief a few kind methods of correcting distortionof Scan Projection Mask Alignment System.
介绍了调整扫描投影式光刻机畸变的几种方法。
3
For example, Projection objects profile and appearance of the projector. The objective should be better correction distortion and like a crooked.