It is found that the barrier width is thinned by the surface defects with high density to enhance the hot electrontunneling.
发现表面高密度缺陷减薄了势垒层厚度,显著增强了热电子隧穿过程。
2
It is assumed that electrontunneling from silicon into oxide and buildup of interface states are the post-irradiation recovery.
假设隧道电子从硅进入氧化层和界面态的建立是辐射效应的恢复机理。
3
It shows that the bias in the post-irradiation recovery period and the ratio of the interface state to the electrontunneling influence the recovery rate.