The depth of diffusionjunction(Xj)is one of the most important parameters in wafer Fab.
在半导体芯片制造过程中,结深是重要的工艺参数之一。
2
Using the photovoltaic spectral response of epitaxial P-N junction, the paper suggests a method of determining the minority carrier diffusion length in N layer of N/P epitaxial silicon wafer.
本文提出了用N/P硅外延片的结光电压光谱响应确定N/P硅外延片中少子扩散长度的方法。
3
A new junction termination technique in which field plate combines with diffusion guard ring is presented. And we discuss the principle and superiority of the new junction termination technique.