A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemicalvapordeposition (MPCVD) method, was developed.
The article has introduced the application and development tendency of techniques of film making with chemicalvapordeposition in all fields.
本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
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The relation between characteristics of hot cathode glow discharge and diamond filmdeposition techniques in hot cathode glow discharge plasma chemicalvapor deposition process was discussed.