Therefore, novel models for thick chemicallyamplified photoresist which fit well characters of SU-8 resist is set up.
因而这篇文章包括了我们在厚的化学放大胶光刻模型方面的努力，这些新的模型适用于SU-8胶。
2
The invention further provides a chemicallyamplified positive resist composition comprising the salt represented by the formula (I).
本发明还提供含有由上述式（I） 表示的盐的化学放大型抗蚀剂组合物。
3
The models are based on usual simulation models for chemicallyamplified photoresist added with swell model and the model for depth - dependent dissolution rate effect.