| 释义 |
1 ?酸洗 ... 酸度，pH，离标hydrogenexponent 酸洗cleaning with acid 酸洗pickling ...
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Wash the wafers with mixed acid, lotion and UPW (ultra pure water) by ultrasonic cleaning in wet sinks to get a clean and dry surface of wafers. 用混合酸、清洗剂和纯水在清洗槽或超声波清洗机内清洗硅片，使其表面洁净并烘干。 - 2
If accidentally stained with paint, you can use gasoline cleaning, attention: do not spray concentrated acid, strong alkali and other strong corrosive substances. 如不慎沾染油漆，可以使用汽油清洗，注意：请勿喷洒浓酸浓碱等强腐性物品。 - 3
Used for engraving glass, cleaning residue on the sand casting, controlled fermentation, power semiconductor wafer polishing and cleaning corrosion (with HNO3 mixed acid). 用于雕刻玻璃、清洗铸件上的残砂、控制发酵、电抛光和清洗腐蚀半导体硅片(与HNO3的混酸)。
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