In the condition of big current and high concentration of carbon particles, masses of curled MWCNTs were obtained on the surface of the cathodedeposition.
在电弧电流较大，碳粒子浓度较高的情况下，可以在阴极表面生成大量弯曲的多壁碳纳米管。
2
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
3
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.