The design and fabrication of wide band infrared antireflectionfilm on Ge substrate micro optical components by ion beam assisted deposition are reported.
简要叙述了锗基片微光学元件红外宽带减反膜的设计与制作。
2
A transparent conductive ITO anti-reflection layer is generated on a top layer of the amorphous silicon thin film sub-battery.
在非 晶硅薄膜子电池的顶层上生成有透明导电的ITO防反射层。
3
A guided-mode resonant filter (GMRF) based on the structure of anti-reflection (ar) thin film waveguide is proposed to realize three-primary-color filter with narrow-band.