A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapordeposition (MPCVD) method, was developed.
MOCVD is an abbreviation form for Metal Organic Chemical VaporDeposition, which is a method used to grow material crystal on substrate via MOCVD device.
Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vaporDeposition (CVD) method.