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单词 vapor deposition method
释义
vapor deposition method
  • 简明释义
  • 气相沉积法
  • 网络释义
  • 1

    ?气相沉积法

    vapor-deposition method 气相沉积法 vapor phase deposition technique 气相淀积技术 ..

短语
  • 双语例句
  • 1
    A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
    提出了一种新颖的多孔硅表面钝化技术,即采用微波等离子体辅助的化学气相沉积(MPCVD)方法在多孔硅上沉积金刚石薄膜。
  • 2
    MOCVD is an abbreviation form for Metal Organic Chemical Vapor Deposition, which is a method used to grow material crystal on substrate via MOCVD device.
    MOCVD是金属有机物化学气相沉积技术的简称,即通过MOCVD设备,在衬底上生长材料晶体的一种方法。
  • 3
    Since carbon nanotubes (CNTs) have been discovered in 1991, they are mainly produced by arc-discharge evaporation and Chemical vapor Deposition (CVD) method.
    纳米碳管自1991年被发现以来,目前主要的制备方法有电弧法和化学气相沉积(cvd)法。
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更新时间:2025/3/29 2:37:44