Correct selection of source gases and their compositions is one of the critical factors for si trenchetching.
源气体及组分的选择是硅槽刻蚀技术的关键因素。
2
The principle of Si trenchetching is introduced, and major press factors to influence etching results are examined.
介绍了硅深槽刻蚀的基本原理和影响对蚀效果的几个主要工艺因素。
3
By optimizing DRIE parameters and RIE etching the trenches' opening, the ideal trench profile is obtained to ensure that the trenches are fully refilled without voids.