Band bending is an effective way to kill viruses because the technique allows electrons, which were freed by the UV, to travel forward and create hydroxyl radicals by reacting with water.

Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source (on the resist formation) were investigated.

The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.