P-type semiconductor zincoxide films, process for preparation thereof, and pulsed laser deposition method using transparent substrates.
型半导体氧化锌薄膜，其制备方法，和使用透明基片的脉冲激光沉积方法。
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Aluminum-doped zincoxide (ZAO) ceramic targets for sputtering were fabricated by hot isostatic pressing (HIP) and ZAO transparent conducting thin films were prepared by dc magnetron sputtering.
With the traditional tin indium oxidetransparent electrode replaced by the zincoxidetransparent electrode of the invention, the manufacturing process is simplified and cost is lowered.