Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
2
The Test Bench built for Wafer Focusing and Leveling Sensor is to measure and evaluate its performance.