The fabrication procedure of the mask and results of the deep Xraylithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
2
In synchrotron radiation X-Raylithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中,由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
3
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-raylithography aligning system, and the numerical analysis was given.