This article will review today's challenges, along with such future trends as integration and through-siliconvia(TSV) technologies.
概述当今的挑战,以及这些集成和硅通孔技术的未来趋势。
2
The methods of 3d interconnection can be classified into the wire bonding, flip chip, throughsiliconvia (TSV) and film wire technology, whose advantages and disadvantages are analyzed.
将实现3d互连的方法分为引线键合、倒装芯片、硅通孔、薄膜导线等,并对它们的优缺点进行了分析。
3
A via hole is formed in the substrate within the spirally patterned conductor layer, the via hole being formed by throughsiliconvia (TSV).