The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputteringsource component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
2
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
3
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.