The third part is to use the sputtering, photolithography to produce heaters and temperature sensors which heat the reaction micro chamber and provide the temperature condition for the PCR reaction.

This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.

Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.