Model of growth, surface morphology, microstructure and of the Uraniun films by magnetron sputterdeposition have been investigated by scanning transmission electron microscopy(STEM).
It can be used for single ion implantation, ion beam mixing, single ion or reactive ion beam sputter-deposition and ion beam enhanced deposition.
可用于单离子注入,离子束混合,单离子或反应离子束溅射淀积以及离子束增强淀积。
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This article introduces processing of plasma chemistry and application of sputter coating and plasma-enhanced chemical vapor deposition in powder metallurgy especially.