A novel passivationtechnology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
It is described that the innovatory technology of selective diffusion and study on surfacepassivation in theory for crystalline silicon solar cell.
本文的主要内容是介绍晶体硅太阳电池选择性扩散新工艺和表面钝化的理论研究。
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The technology of surfacepassivation and morphology controlling of porous silicon (PS) exhibits high scientific values for both fundamental and application research.