The technology will be based on a planar process with enhanced high-K metal gate (HKMG), novel strainedsilicon, and low-resistance copper ultra-low-K interconnects.
该技术将基于一个具有增强的高- k金属闸(HKMG平面工艺),新型应变硅,低电阻铜超低K互连。
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Strainedsilicon is a fundamental component of all recent microprocessors. The reason for its success is that local strain-induced deformation in the crystal lattice improves processor performance.