Inorganic substrate with a thin silica type glass layer, method of manufacturing the aforementioned substrate, coating agent, and a semiconductor device.
具有二氧化硅类玻璃薄层的无机基底，制备前述基底的方法，涂布剂和半导体器件。
2
At ordinary temperatures silicon is impervious to air, but at high temperatures it reacts with oxygen, forming a layer of silica that does not react further.
在常温下，硅不和空气反应，但是在高温下它和氧气反应，形成一层硅石，不再继续发生反应。
3
The coating layer of silica and magnesium oxides was prepared by sol-gel method.