Both SiO2 protective layers and annealing are beneficial to the damage resistance of the films and the latter is more effective to improve the LIDT.
SiO2保护层和退火都有利于提高Ta2O5薄膜的抗激光损伤能力，并且退火对提高阈值的影响更为明显。
2
Some detail explanation on the influence of anneal on the properties including transmittance, refractive index, and volume fraction porosity of the SiO2 thin films were also given.
研究了退火时透过率、折射率以及气孔率的影响，并做出比较详细的理论解释。
3
The effects of SiO2 protective layers and annealing on the laser-induced damage threshold (LIDT) of the films are investigated.