An experiment was conducted to study the high-temperature annealing characteristics of polysilicon films using atomic force microscope, secondaryion mass spectroscopy and probe.
利用原子力显微镜、二次离子质谱分析仪和探针，对多晶硅薄膜的高温退火特性进行了实验研究。
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Among the destructive techniques able to provide the desired depth resolution the most widely used technique is secondary-ion-mass spectroscopy (SIMS).