Secondaryionmassspectrometry was used to measure the distribution of implanted depths of boron ions.
用二次离子质谱测量了注入硼离子的深度分布。
2
Additionally, chemical composition and thickness of oxide layers, occurring in both studied cases, were analyzed by secondaryionmassspectrometry.
此外,两种不同表面状态下的化学成分以及氧化层都通过二次离子质谱测定法进行了分析。
3
Time-of-Flight secondaryionmassspectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications.