The positivephotoresist composition which is suitable for used in a resist coating method by a discharge nozzle system can be provided according to the invention.
根据本发明可提供能够适用于排出喷嘴式的抗蚀剂涂布法的正型光致抗蚀剂组合物。
2
We can better control the positivephotoresist figure, provide a reference for making MEMS and MOEMS, it is of an important instructional significance for deep relief of micro structure.
The mechanisms of dissolution inhibition of positivephotoresist based on novolak(NVK)-diazonaphthoquinone(DNQ), including(1) the molecular hydrogen bonding interactions between novolak and DNQ;