An alternative current medium frequency pulsedmagnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
2
The pressure measurement and the design basics of the co-axial pulsedmagnetron discharge vacuum gauge for vacuum interrupters were discussed.
介绍了同轴场式脉冲磁控真空计的测量原理以及设计中的有关问题。
3
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.